Washington, DC, United States of America

Aaron Scott Lukas


 

Average Co-Inventor Count = 6.1

ph-index = 8

Forward Citations = 1,310(Granted Patents)


Location History:

  • Allentown, PA (US) (2005 - 2006)
  • Lansdale, PA (US) (2006 - 2012)
  • Washington, DC (US) (2008 - 2016)

Company Filing History:


Years Active: 2005-2016

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18 patents (USPTO):Explore Patents

Title: Innovations by Aaron Scott Lukas in Washington, DC

Introduction

Aaron Scott Lukas, based in Washington, DC, is an innovative inventor with a remarkable portfolio of 18 patents. His contributions span various technologies and processes, showcasing his expertise in materials science and chemical engineering.

Latest Patents

Among his latest patents, Lukas has developed a novel process for forming an air gap within a substrate. This process involves the deposition of at least one sacrificial material precursor, followed by the creation of a composite layer. The innovative method includes removing the porogen material in the composite layer to form a porous structure, ultimately resulting in air gaps within the substrate. Specifically, the sacrificial material precursor may comprise organic porogen, silicon, or a polar solvent-soluble metal oxide.

Additionally, one of his notable contributions is related to the production of porous organosilica glass films with low dielectric constants. This patent involves a chemical vapor deposition technique where gaseous reagents, including organosilane and organosiloxane precursors and a distinct porogen, are introduced into a vacuum chamber. The energy applied in the chamber facilitates the deposition of a preliminary film, which is then treated to eliminate labile organic materials, resulting in a porous film that exhibits dielectric constants below 2.6.

Career Highlights

Aaron Scott Lukas is currently associated with Air Products and Chemicals, Inc., a well-regarded firm in the specialty gases and chemicals sector. His role at the company allows him to drive innovations that contribute significantly to advancements in material applications.

Collaborations

Throughout his career, Lukas has collaborated with esteemed colleagues—including Raymond Nicholas Vrtis and Mark Leonard O'Neill—who have likely played a role in the development and refinement of his patented technologies and methods.

Conclusion

With his extensive patent portfolio and innovative contributions to the field of materials science, Aaron Scott Lukas continues to be an influential figure in Washington, DC's research landscape. His work exemplifies the spirit of innovation and the ongoing quest for technological advancement in substrate materials and processes.

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