The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Oct. 31, 2008
Aaron Scott Lukas, Washington, DC (US);
Mark Leonard O'neill, Allentown, PA (US);
Jean Louise Vincent, Bethlehem, PA (US);
Raymond Nicholas Vrtis, Orefield, PA (US);
Mark Daniel Bitner, Nazareth, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Aaron Scott Lukas, Washington, DC (US);
Mark Leonard O'Neill, Allentown, PA (US);
Jean Louise Vincent, Bethlehem, PA (US);
Raymond Nicholas Vrtis, Orefield, PA (US);
Mark Daniel Bitner, Nazareth, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In one aspect of the present invention, an organosilicate glass film is exposed to an ultraviolet light source wherein the film after exposure has an at least 10% or greater improvement in its mechanical properties (i.e., material hardness and elastic modulus) compared to the as-deposited film.