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For the Inventor, By the Inventor

Nazareth, PA, United States of America

Mark Daniel Bitner

This inventor holds 10 USPTO granted patents and 5 EPO patents. Top assignee: Air Products and Chemicals, Inc.. Active years: 2006-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Daniel Bitner. Retrieved from https://idiyas.com/inventor/mark-daniel-bitner

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 70.0

 

Average Co-Inventor Count = 6.3

ph-index = 6

Forward Citations = 652(Granted Patents)


Company Filing History:

goldMedal10 out of 3,219 
 
Air Products and Chemicals, Inc.
 patents

Years Active: 2006-2016

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10 patents (USPTO):Explore Patents
1. 9293361 - Materials and methods of forming controlled void (2016-03-22),
2. 8846522 - Materials and methods of forming controlled void (2014-09-30),
3. 8399349 - Materials and methods of forming controlled void (2013-03-19),
4. 8137764 - Mechanical enhancer additives for low dielectric films (2012-03-20),
5. 7932188 - Mechanical enhancement of dense and porous organosilicate materials by UV exposure (2011-04-26),
6. 7470454 - Non-thermal process for forming porous low dielectric constant films (2008-12-30),
7. 7468290 - Mechanical enhancement of dense and porous organosilicate materials by UV exposure (2008-12-23),
8. 7404990 - Non-thermal process for forming porous low dielectric constant films (2008-07-29),
9. 7098149 - Mechanical enhancement of dense and porous organosilicate materials by UV exposure (2006-08-29),
10. 7074489 - Low dielectric constant material and method of processing by CVD (2006-07-11),

Title: The Inventor Spotlight: Mark Daniel Bitner Shaping the Future with Controlled Voids

Introduction:

Mark Daniel Bitner, a prolific inventor based in Nazareth, PA (US), is making waves in the field of materials science with his groundbreaking innovations. With a portfolio of 10 patents to his name, Bitner's work at Air Products and Chemicals, Inc. is pushing the boundaries of controlled void formation within substrates.

Latest Patents:

Bitner's latest patents revolve around the development of materials and methods for forming controlled voids within substrates. His innovative process involves depositing sacrificial materials, creating porous layers, and utilizing removal media to generate air gaps within the substrate. This cutting-edge technique holds tremendous promise for various industries seeking lightweight, high-performance materials.

Career Highlights:

Throughout his career, Bitner has demonstrated a keen eye for innovation and a relentless pursuit of excellence. His contributions to the field of materials science have earned him recognition as a thought leader in the industry. By securing 10 patents, Bitner has cemented his reputation as a trailblazer in controlled void formation technologies.

Collaborations:

In his quest for innovation, Bitner has collaborated closely with esteemed colleagues at Air Products and Chemicals, Inc. Two notable coworkers who have contributed to his success are Aaron Scott Lukas and Mark Leonard O'Neill. Together, they form a dynamic team that drives forward-thinking research and development initiatives.

Conclusion:

Mark Daniel Bitner's pioneering work in materials science is revolutionizing the way we think about controlled void formation. With a steadfast commitment to innovation and a track record of success, Bitner continues to shape the future of substrates and materials engineering. His patents stand as a testament to his ingenuity and dedication to advancing technological frontiers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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