The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
Dec. 12, 2002
Mark Leonard O'neill, Allentown, PA (US);
Aaron Scott Lukas, Allentown, PA (US);
Mark Daniel Bitner, Nazareth, PA (US);
Jean Louise Vincent, Bethlehem, PA (US);
Raymond Nicholas Vrtis, Allentown, PA (US);
Brian K. Peterson, Fogelsville, PA (US);
Mark Leonard O'Neill, Allentown, PA (US);
Aaron Scott Lukas, Allentown, PA (US);
Mark Daniel Bitner, Nazareth, PA (US);
Jean Louise Vincent, Bethlehem, PA (US);
Raymond Nicholas Vrtis, Allentown, PA (US);
Brian K. Peterson, Fogelsville, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
Organofluorosilicate glass films contain both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species. Preferred films are represented by the formula SiOCHF, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic % y is from 10 to 50 atomic %, x is from 1 to 30 atomic %, z is from 0.1 to 15 atomic %, and x/z is optionally greater than 0.25, wherein substantially none of the fluorine is bonded to the carbon. In one embodiment there is provided a CVD method that includes: providing a substrate within a vacuum chamber; introducing into the vacuum chamber gaseous reagents including a fluorine-providing gas, an oxygen-providing gas and at least one precursor gas selected from an organosilane and an organosiloxane; and applying energy to the gaseous reagents in the chamber to induce reaction of the gaseous reagents and to form the film on the substrate.