The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Mar. 29, 2007
Raymond Nicholas Vrtis, Orefield, PA (US);
Dingjun Wu, Macungie, PA (US);
Mark Leonard O'neill, Allentown, PA (US);
Mark Daniel Bitner, Nazareth, PA (US);
Jean Louise Vincent, Bethlehem, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Aaron Scott Lukas, Washington, DC (US);
Raymond Nicholas Vrtis, Orefield, PA (US);
Dingjun Wu, Macungie, PA (US);
Mark Leonard O'Neill, Allentown, PA (US);
Mark Daniel Bitner, Nazareth, PA (US);
Jean Louise Vincent, Bethlehem, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Aaron Scott Lukas, Washington, DC (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
The present invention is a process for forming an air gap within a substrate, the process comprising: providing a substrate; depositing a sacrificial material by deposition of at least one sacrificial material precursor; depositing a composite layer; removale of the porogen material in the composite layer to form a porous layer and contacting the layered substrate with a removal media to substantially remove the sacrificial material and provide the air gaps within the substrate; wherein the at least one sacrificial material precursor is selected from the group consisting of: an organic porogen; silicon, and a polar solvent soluble metal oxide and mixtures thereof.