The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Apr. 07, 2003
Raymond Nicholas Vrtis, Orefield, PA (US);
Mark Leonard O'neill, Allentown, PA (US);
Jean Louise Vincent, Bethlehem, PA (US);
Aaron Scott Lukas, Lansdale, PA (US);
Manchao Xiao, San Diego, CA (US);
John Anthony Thomas Norman, Encinitas, CA (US);
Raymond Nicholas Vrtis, Orefield, PA (US);
Mark Leonard O'Neill, Allentown, PA (US);
Jean Louise Vincent, Bethlehem, PA (US);
Aaron Scott Lukas, Lansdale, PA (US);
Manchao Xiao, San Diego, CA (US);
John Anthony Thomas Norman, Encinitas, CA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A porous organosilica glass (OSG) film consists of a single phase of a material represented by the formula SiOCHF, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic %, x is from 5 to 30 atomic %, y is from 10 to 50 atomic % and z is from 0 to 15 atomic %, wherein the film has pores and a dielectric constant less than 2.6. The film is provided by a chemical vapor deposition method in which a preliminary film is deposited from organosilane and/or organosiloxane precursors and pore-forming agents (porogens), which can be independent of, or bonded to, the precursors. The porogens are subsequently removed to provide the porous film. Compositions, such as kits, for forming the films include porogens and precursors. Porogenated precursors are also useful for providing the film.