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Semiconductor Process Laboratory Co., Ltd.

USPTO Granted Patents = 33

Forward Citations = 1,088

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25 inventors (with patents filed for the assignee):

Kazuo Maeda (28 out of 88 patents)

Noboru Tokumasu (13 out of 23 patents)

Kouichi Ohira (7 out of 17 patents)

4. Yoshimi Shioya (5 out of 17 patents)

5. Yuko Nishimoto (5 out of 7 patents)

6. Setsu Suzuki (4 out of 6 patents)

7. Yoshiaki Yuyama (4 out of 5 patents)

8. Yuhko Nishimoto (3 out of 10 patents)

9. Hiroshi Chino (3 out of 3 patents)

10. Mitsuo Hirose (3 out of 3 patents)

11. Junichi Aoki (2 out of 11 patents)

12. Tomomi Suzuki (2 out of 13 patents)

13. Yuichiro Kotake (2 out of 5 patents)

14. Hiroshi Ikakura (2 out of 18 patents)

15. Shoji Ohgawara (2 out of 6 patents)

33 patents: Sort by Forward Citations

1. 7329612 - Semiconductor device and process for producing the same (2008-02-12),

2. 7238629 - Deposition method, method of manufacturing semiconductor device, and semiconductor device (2007-07-03),

3. 7132171 - Low dielectric constant insulating film and method of forming the same (2006-11-07),

4. 6911405 - Semiconductor device and method of manufacturing the same (2005-06-28),

5. 6900144 - Film-forming surface reforming method and semiconductor device manufacturing method (2005-05-31),

6. 6852651 - Semiconductor device and method of manufacturing the same (2005-02-08),

7. 6514884 - Method for reforming base surface, method for manufacturing semiconductor device and equipment for manufacturing the same (2003-02-04),

8. 6352943 - Method of film formation and method for manufacturing semiconductor device (2002-03-05),

9. 6207537 - Method for formation of impurity region in semiconductor layer and apparatus for introducing impurity to semiconductor layer (2001-03-27),

10. 6133162 - Method of forming a film by using plasmanized process gas containing (2000-10-17),

11. 6133160 - Method for reforming undercoating surface and method for production of (2000-10-17),

12. 6124210 - Method of cleaning surface of substrate and method of manufacturing (2000-09-26),

13. 6110814 - Film forming method and semiconductor device manufacturing method (2000-08-29),

14. 6110290 - Method for epitaxial growth and apparatus for epitaxial growth (2000-08-29),

15. 5952157 - Method for removal of resist film and method for production of (1999-09-14),

Semiconductor Process Laboratory Co., Ltd. is a leading provider of advanced semiconductor solutions, specializing in the development and manufacturing of semiconductor process equipment and materials. With decades of experience, we offer innovative and reliable products that enable our customers to optimize their manufacturing processes and enhance their product performance. Our dedicated team of experts upholds the highest standards of quality and integrity, ensuring customer satisfaction. Visit our website to learn more about our cutting-edge solutions and how we can help your semiconductor manufacturing needs.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

33 Patents

#22 in Chiba

#2,148 in Japan

#19,529 in the World

Semiconductor Process Laboratory Co., Ltd.

Forward Citations = 1,088

25 inventors:

Kazuo Maeda (28 out of 88 patents)

Noboru Tokumasu (13 out of 23 patents)

Kouichi Ohira (7 out of 17 patents)

4. Yoshimi Shioya (5 out of 17 patents)

5. Yuko Nishimoto (5 out of 7 patents)

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