Yoshiaki Yuyama

Title: Yoshiaki Yuyama: Innovator in Semiconductor Technology

Introduction

Yoshiaki Yuyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on enhancing the performance and reliability of integrated circuits.

Latest Patents

Yuyama's latest patents include a semiconductor integrated circuit device and a manufacturing method thereof. This invention involves a circuit region on a main surface of a silicon-on-insulator (SOI) substrate, with an isolating region defined by insulating isolation trenches. These regions are connected by wiring resistors or diffused resistors within the SOI substrate. The design aims to improve the distribution of voltage applied between the circuit regions, thereby increasing the withstand voltage of the semiconductor integrated circuit. Another notable patent is a method for forming a fluorine-containing silicon oxide film. This method utilizes thermal chemical vapor deposition (CVD) to create a film on a substrate through the thermal reaction of a mixed gas, which includes organic silanes and ozone.

Career Highlights

Throughout his career, Yuyama has worked with notable companies such as Canon Sales Co., Inc. and Semiconductor Process Laboratory Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor processes and technologies.

Collaborations

Yuyama has collaborated with several professionals in his field, including Kazuo Maeda and Noboru Tokumasu. These partnerships have likely enriched his research and development efforts.

Conclusion

Yoshiaki Yuyama's innovative work in semiconductor technology has led to significant advancements in integrated circuit design and manufacturing. His contributions continue to influence the industry and pave the way for future innovations.