The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 1996
Filed:
Oct. 31, 1994
Applicant:
Inventors:
Assignees:
Semiconductor Process Laboratory Co., Ltd., , JP;
Canon Sales Co., Inc., , JP;
Alcan-Tech Co., Inc., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ; H05H / ; C23C / ;
U.S. Cl.
CPC ...
427539 ; 427535 ; 427579 ; 4272553 ;
Abstract
A method for reforming an insulating film such as a BSG film formed by a CVD technique. The method reduces the parasitic capacitance between conductor layers having an intervening film, especially a BSG film, and includes the steps of depositing a BSG film on a substrate from a gaseous source and exposing the BSG film to a reforming gas plasma.