The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 1999
Filed:
Sep. 12, 1997
Applicant:
Inventors:
Toshio Kato, Tokyo, JP;
Noboru Tokumasu, Tokyo, JP;
Assignees:
Canon Sales Co., Inc., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430329 ; 134-13 ;
Abstract
This invention concerns a method for the removal of a resist film containing phosphorus (P) or boron (B) or other inorganic element. Specifically, a resist film 42 formed on a substrate 41 is exposed to the liquid or gas of chlorosulfonic acid �SO.sub.2 Cl(OH)! and caused to react with the acid and, consequently, is enabled to be removed from the substrate 41.
Quick Actions:
Kato, Toshio. (1999). Method for removal of resist film and method for production of (U.S. Patent No. 5952157). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5952157
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