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For the Inventor, By the Inventor

Marlborough, MA, United States of America

Rohm & Haas Electronic Materials LLC


USPTO Granted Patents = 696



Trademarks = 28

Forward Citations = 3,511

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565 inventors (with patents filed for the assignee):

goldMedal Peter Trefonas, Iii (84 out of 118 patents)

silverMedal Cheng-Bai Xu (61 out of 65 patents)

bronzeMedal Mingqi Li (60 out of 63 patents)

4.  Deyan Wang (59 out of 65 patents)

5.  James F Cameron (56 out of 97 patents)

6.  Cong Liu (56 out of 58 patents)

7.  Phillip Dene Hustad (46 out of 95 patents)

8.  Emad Aqad (44 out of 47 patents)

9.  Maria Anna Rzeznik (42 out of 47 patents)

10.  Michael K Gallagher (42 out of 62 patents)

11.  Jong Keun Park (41 out of 45 patents)

12.  James W Thackeray (40 out of 92 patents)

13.  Shintaro Yamada (34 out of 39 patents)

14.  Suzanne M Coley (28 out of 38 patents)

15.  Robert K Barr (27 out of 57 patents)


Core Competencies:
Metal-Clad Polymer Films
Nickel Electroplating
Photoacid Generators
Photoresist Compositions
Optically Clear Fluids
Composite Materials
Gas Sensors
Tunable Refractive Index Polymers
Silicon-Containing Underlayers
Polyimide-Polyarylene Polymers
Anti-Reflective Coating
Electroplating Compositions

696 patents:

1. 12442084 - Metal-clad polymer films and electronic devices (2025-10-14),
2. 12428744 - Nickel electroplating compositions for rough nickel (2025-09-30),
3. 12411409 - Aromatic underlayer (2025-09-09),
4. 12398479 - Copper electroplating baths containing reaction products of amines, polyacrylamides and bisepoxoides (2025-08-26),
5. 12228859 - Pattern formation methods (2025-02-18),
6. 12140866 - Photoacid generators, photoresist compositions, and pattern formation methods (2024-11-12),
7. 12099300 - Aromatic underlayer (2024-09-24),
8. 12085854 - Photoresist compositions and pattern formation methods (2024-09-10),
9. 11999844 - Optically clear shear thickening fluids and optical display device comprising same (2024-06-04),
10. 11960206 - Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device (2024-04-16),
11. 11947258 - Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition (2024-04-02),
12. 11940732 - Coating compositions and methods of forming electronic devices (2024-03-26),
13. 11940731 - Photoresist topcoat compositions and methods of processing photoresist compositions (2024-03-26),
14. 11940730 - Photoresist compositions and pattern formation methods (2024-03-26),
15. 11932713 - Monomers, polymers and lithographic compositions comprising same (2024-03-19),
Rohm & Haas Electronic Materials LLC is a leading global manufacturer of electronic materials for the semiconductor and printed circuit board industries. They offer a wide range of high-performance materials, including photoresists, etchants, and dielectric coatings. Their products are used in various applications, such as integrated circuits, displays, and renewable energy devices. With a commitment to innovation and customer satisfaction, Rohm & Haas Electronic Materials LLC strives to provide cutting-edge solutions that enable the development of advanced electronic devices.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 9 2025

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696 Patents

#2 in Marlborough, MA

#42 in Massachusetts

#699 in US

#1,393 in the World

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Marlborough, MA, United States of America

Rohm & Haas Electronic Materials LLC

Forward Citations = 3,511

565 inventors:

goldMedal Peter Trefonas, Iii (84 out of 118 patents)

silverMedal Cheng-Bai Xu (61 out of 65 patents)

bronzeMedal Mingqi Li (60 out of 63 patents)

4.  Deyan Wang (59 out of 65 patents)

5.  James F Cameron (56 out of 97 patents)

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