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Mitsubishi Materials Silicon Corporation

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USPTO Granted Patents = 51

EPO Patents = 2

Forward Citations = 833

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96 inventors (with patents filed for the assignee):

Hisashi Furuya (15 out of 21 patents)

Takashi Atami (8 out of 12 patents)

Keisei Abe (6 out of 8 patents)

4. Hiroaki Taguchi (5 out of 15 patents)

5. Michio Kida (5 out of 18 patents)

6. Hiroyuki Shiraki (4 out of 8 patents)

7. Norihisa Machida (4 out of 5 patents)

8. Yoji Suzuki (3 out of 25 patents)

9. Takaaki Shiota (3 out of 8 patents)

10. Kazuhiro Ikezawa (3 out of 4 patents)

11. Kazutaka Terashima (3 out of 25 patents)

12. Hideo Nakanishi (3 out of 13 patents)

13. Hiroyuki Oi (3 out of 4 patents)

14. Hiroshi Koya (3 out of 4 patents)

15. Yoshiaki Arai (3 out of 11 patents)

Core Competencies:

Silicon Wafer

Epitaxial Growth

Single Crystal

CVD Apparatus

Polycrystalline Silicon

Impurity Analysis

Heat Treatment

Defect Removal

Semiconductor Substrate

Gettering Layer

Wafer Binding

Crystal-Pulling Apparatus

51 patents: Sort by Forward Citations

1. 7067428 - Method for cleaning polysilicon (2006-06-27),

2. 6995834 - Method for analyzing impurities in a silicon substrate and apparatus for decomposing a silicon substrate through vapor-phase reaction (2006-02-07),

3. 6916657 - Evaluation method for polycrystalline silicon (2005-07-12),

4. 6887721 - Method of purging CVD apparatus and method for judging maintenance of times of semiconductor production apparatuses (2005-05-03),

5. 6818197 - Epitaxial wafer (2004-11-16),

6. 6815774 - Dielectrically separated wafer and method of the same (2004-11-09),

7. 6693286 - Method for evaluating the quality of a semiconductor substrate (2004-02-17),

8. 6682597 - Silicon wafer, and heat treatment method of the same and the heat-treated silicon wafer (2004-01-27),

9. 6663708 - Silicon wafer, and manufacturing method and heat treatment method of the same (2003-12-16),

10. 6562692 - Dielectric isolated wafer and its production method (2003-05-13),

11. 6547875 - Epitaxial wafer and a method for manufacturing the same (2003-04-15),

12. 6534774 - Method and apparatus for evaluating the quality of a semiconductor substrate (2003-03-18),

13. 6472289 - Dielectrically separated wafer and method of manufacturing the same (2002-10-29),

14. 6451107 - Method for simulating the shape of the solid-liquid interface between a single crystal and a molten liquid, and the distribution of point defects of the single crystal (2002-09-17),

15. 6447600 - Method of removing defects of single crystal material and single crystal material from which defects are removed by the method (2002-09-10),

Company Overview

Mitsubishi Materials Silicon Corporation, based in Tokyo, specializes in advanced silicon wafer technology, crucial for semiconductor manufacturing. The company focuses on the development and production of high-quality silicon wafers, employing techniques such as epitaxial growth and CVD apparatus to enhance performance. Their expertise extends to polycrystalline silicon, impurity analysis, heat treatment, and defect removal, positioning them as a key player in the semiconductor supply chain and contributing to innovations in various electronic applications.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

51 Patents

#786 in Tokyo

#1,685 in Japan

#13,788 in the World

Mitsubishi Materials Silicon Corporation

Forward Citations = 833

96 inventors:

Hisashi Furuya (15 out of 21 patents)

Takashi Atami (8 out of 12 patents)

Keisei Abe (6 out of 8 patents)

4. Hiroaki Taguchi (5 out of 15 patents)

5. Michio Kida (5 out of 18 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Mitsubishi Materials Silicon Corporation. Retrieved from https://idiyas.com/company/mitsubishi-materials-silicon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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