Hiroyuki Shiraki

Title: Hiroyuki Shiraki: Innovator in Silicon Wafer Technology

Introduction

Hiroyuki Shiraki is a prominent inventor based in Tokyo, Japan, known for his significant contributions to silicon wafer technology. With a total of eight patents to his name, he has made remarkable advancements in the field of semiconductor manufacturing.

Latest Patents

One of his latest patents is a heat treatment jig and heat treatment method for silicon wafers. This innovative jig allows for the heat treatment of silicon wafers while they are mounted on support projections from three support arms. The design ensures that all support projections are positioned on the same circle within a specific radial distance from the center of the wafer. This method effectively controls the depth of dislocations generated during the process, resulting in a slip-free region on the wafer's surface. Another notable patent is a production method for silicon wafers, which involves thermal annealing in a nitride gas atmosphere. This technique allows for the formation of new vacancies while suppressing slip generation, thus providing satisfactory surface roughness.

Career Highlights

Hiroyuki Shiraki has worked with notable companies in the semiconductor industry, including Mitsubishi Materials Silicon Corporation and Sumitomo Mitsubishi Silicon Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in silicon wafer technology.

Collaborations

Throughout his career, Shiraki has collaborated with esteemed colleagues such as Takeshi Hasegawa and Yoshinobu Nakada. These partnerships have fostered a collaborative environment that has led to significant advancements in their field.

Conclusion

Hiroyuki Shiraki's contributions to silicon wafer technology through his patents and collaborations highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in this critical area of technology.