Omiya, Japan

Norihisa Machida


Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 66(Granted Patents)


Location History:

  • Saitama, JP (1995)
  • Saitama-ken, JP (1998)
  • Omiya, JP (1998 - 2001)

Company Filing History:


Years Active: 1995-2001

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5 patents (USPTO):Explore Patents

Title: Norihisa Machida: Innovator in Semiconductor Technology

Introduction

Norihisa Machida is a prominent inventor known for his contributions to semiconductor technology. He is based in Omiya, Japan, and holds a total of five patents. His work focuses on developing systems for growing high-quality single crystals, which are essential in various electronic applications.

Latest Patents

Machida's latest patents include a semiconductor single-crystal growth system and a method for growing semiconductor single crystals. The growth system features an inverted conical flow-guide cover placed above a double-walled crucible, designed to enhance gas-flow guiding functions near the melt. This innovative design includes a short passage through the sidewall of the inner crucible and a flow guide cylinder, all arranged within a furnace to optimize the crystal growth process.

Career Highlights

Throughout his career, Machida has worked with notable companies such as Mitsubishi Materials Silicon Corporation and Mitsubishi Materials Corporation. His experience in these organizations has significantly contributed to his expertise in semiconductor technologies.

Collaborations

Some of Machida's coworkers include Yoshiaki Arai and Keisei Abe, who have collaborated with him on various projects in the semiconductor field.

Conclusion

Norihisa Machida's innovative work in semiconductor technology has made a significant impact on the industry. His patents reflect a commitment to advancing the methods of crystal growth, which are crucial for the development of high-performance electronic devices.

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