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Hosei University

USPTO Granted Patents = 14

EPO Patents = 3

Forward Citations = 1

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26 inventors (with patents filed for the assignee):

Fumimasa Horikiri (5 out of 53 patents)

Tomoyoshi Mishima (5 out of 21 patents)

Mitsuru Shinagawa (4 out of 4 patents)

4. Hiroshi Ohta (3 out of 76 patents)

5. Jun Katsuyama (3 out of 4 patents)

6. Yoshinori Matsumoto (3 out of 9 patents)

7. Sousuke Nakamura (2 out of 2 patents)

8. Yasuhiro Yamamoto (2 out of 2 patents)

9. Tohru Nakamura (2 out of 38 patents)

10. Hiroaki Tanaka (1 out of 76 patents)

11. Takashi Touma (1 out of 4 patents)

12. Chiaki Tanuma (1 out of 40 patents)

13. Yoshinori Tsuruda (1 out of 3 patents)

14. Takahiro Miyaura (1 out of 1 patent)

15. Koichi Kusakabe (1 out of 5 patents)

14 patents: Sort by Forward Citations

1. 12569179 - Biological information acquisition system and electrode sheet (2026-03-10),

2. 12174231 - Measurement device and measurement method (2024-12-24),

3. 12117475 - Electric field sensor (2024-10-15),

4. 11885841 - Electric field sensor (2024-01-30),

5. 11876575 - Electric field communication system (2024-01-16),

6. 11640906 - Crystal laminate, semiconductor device and method for manufacturing the same (2023-05-02),

7. 11101699 - Power reception device, wearable device, and non-contact power feeding system (2021-08-24),

8. 11097530 - Three-dimensional modeling device and three-dimensional modeling method (2021-08-24),

9. 11072524 - Carbon-based hydrogen storage material having autocatalytic capability, production method thereof, and hydrogen adsorbing—storing method, hydrogen releasing method, and hydrogen adsorption—storage device using thereof (2021-07-27),

10. 10998188 - Gallium nitride laminated substrate and semiconductor device (2021-05-04),

11. 10797181 - Semiconductor device and method for manufacturing the same (2020-10-06),

12. 10685841 - Semiconductor device (2020-06-16),

13. 10483350 - Semiconductor device (2019-11-19),

14. 10378084 - Method for concentrating metal compound by reduction and oxidation (2019-08-13),

Company Overview

Hosei University, located in Tokyo, Japan, is a prominent institution known for its comprehensive educational offerings and research initiatives. The university specializes in a diverse range of fields, including law, economics, social sciences, and engineering, fostering a multidisciplinary approach to education and innovation. Hosei is committed to advancing knowledge and technology, contributing to both local and global communities through its academic programs and research endeavors.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

14 Patents

#1,599 in Tokyo

#3,584 in Japan

#42,290 in the World

Hosei University

Forward Citations = 1

26 inventors:

Fumimasa Horikiri (5 out of 53 patents)

Tomoyoshi Mishima (5 out of 21 patents)

Mitsuru Shinagawa (4 out of 4 patents)

4. Hiroshi Ohta (3 out of 76 patents)

5. Jun Katsuyama (3 out of 4 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Hosei University. Retrieved from https://idiyas.com/company/hosei-university

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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