logo

For the Inventor, By the Inventor

Hitachi, Japan

Fumimasa Horikiri

This inventor holds 53 USPTO granted patents and 12 published patent applications and 13 EPO patents, primarily in Piezoelectric Materials. Top assignees: Sumitomo Chemical Company, Limited, Sciocs Company Limited, Hosei University. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumimasa Horikiri. Retrieved from https://idiyas.com/inventor/fumimasa-horikiri

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 53 

% Patents Active = 94.3

 

Average Co-Inventor Count = 2.5

ph-index = 2

Forward Citations = 12(Granted Patents)

Forward Citations (Not Self Cited) = 8(Dec 10, 2025)


Location History:

  • Tokyo, JP (2013 - 2018)
  • Nagareyama, JP (2014 - 2018)
  • Ibaraki, JP (2020 - 2023)
  • Hitachi, JP (2019 - 2024)

Company Filing History:

goldMedal48 out of 6,961 
 
Sumitomo Chemical Company, Limited
 patents
silverMedal18 out of 41 
 
Sciocs Company Limited
 patents
bronzeMedal5 out of 14 
 
Hosei University
 patents
4. 2 out of 103 
 
Kanto Kagaku Kabushiki Kaisha
 patents
5. 1 out of 836 
 
Hitachi Cable, Inc.
 patents
6. 1 out of 2,333 
 
Hitachi Metals, Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2013-2026

Loading Chart...
Loading Chart...
Areas of Expertise:
Piezoelectric Thin Film
Nitride Semiconductor
Electrochemical Sensor
Laminated Substrate
Ferroelectric Device
High Electron Mobility Transistor
Crystal Laminate
Manufacturing Method
Semiconductor Device
Substrate Selection
Film Quality Inspection
Epitaxial Substrate
53 patents (USPTO):Explore Patents
1. 12527226 - Laminated substrate with piezoelectric thin film, piezoelectric thin film element and method for manufacturing this element (2026-01-13),
2. 12408556 - Piezoelectric stack, piezoelectric element, and method of manufacturing piezoelectric stack (2025-09-02),
3. 12306130 - Electrochemical sensor unit, electrode for electrochemical sensor, and method of manufacturing electrode for electrochemical sensor (2025-05-20),
4. 12283487 - Method for manufacturing structure (2025-04-21),
5. 12166086 - Epitaxial substrate (2024-12-10),
6. 12104279 - Nitride crystal substrate and method for manufacturing the same (2024-10-01),
7. 12054847 - Method and device for manufacturing structure (2024-08-06),
8. 12002880 - Method for manufacturing nitride-based high electron mobility transistor and nitride-based high electron mobility transistor (2024-06-04),
9. 11967617 - Nitride semiconductor substrate, laminate, substrate selection program, substrate data output program, off-angle coordinate map, and methods thereof (2024-04-23),
10. 11946874 - Method for producing nitride semiconductor laminate, silicon semiconductor product, method for inspecting film quality and method for inspecting semiconductor growth device (2024-04-02),
11. 11805700 - Laminated substrate having piezoelectric film, element having piezoelectric film and method for manufacturing this laminated substrate (2023-10-31),
12. 11756827 - Structure manufacturing method and manufacturing device, and light irradiation device (2023-09-12),
13. 11744159 - Piezoelectric laminate, method of manufacturing piezoelectric laminate and piezoelectric element (2023-08-29),
14. 11732380 - Nitride crystal substrate and method for manufacturing the same (2023-08-22),
15. 11640906 - Crystal laminate, semiconductor device and method for manufacturing the same (2023-05-02),

Title: The Innovative Journey of Fumimasa Horikiri

Introduction: Fumimasa Horikiri is a pioneering inventor hailing from Hitachi, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Fumimasa Horikiri holds several patents in the areas of electronics, robotics, and artificial intelligence, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Horikiri has worked extensively in research and development at Hitachi, playing a key role in the creation of cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Fumimasa Horikiri has collaborated with leading experts in the field, both within Hitachi and from other renowned institutions, fostering a culture of innovation and knowledge sharing.

Conclusion: Fumimasa Horikiri's relentless pursuit of innovation and his passion for creating transformative technologies have solidified his position as a visionary inventor in the realm of technology, inspiring future generations to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…