For the Inventor, By the Inventor

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Hsinchu, Taiwan

Hermes Microvision Inc.

USPTO Granted Patents = 160

% Expired Patents = 24.4

EPO Patents = 4

Trademarks = 1

Forward Citations = 1,376

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72 inventors (with patents filed for the assignee):

Zhongwei Chen (51 out of 90 patents)

Jack Jau (43 out of 53 patents)

Weiming Ren (42 out of 102 patents)

4. Wei Fang (28 out of 73 patents)

5. Xuedong Liu (28 out of 87 patents)

6. Shuai Li (23 out of 53 patents)

7. Hong Xiao (21 out of 38 patents)

8. Joe Wang (18 out of 24 patents)

9. Chung-Shih Pan (16 out of 20 patents)

10. Chiyan Kuan (15 out of 22 patents)

11. Zhong-wei Chen (15 out of 50 patents)

12. You-Jin Wang (15 out of 15 patents)

13. Yi-Xiang Wang (13 out of 13 patents)

14. Yan Zhao (12 out of 14 patents)

15. Juying Dou (9 out of 19 patents)

Core Competencies:

Charged Particle Source

Defect Inspection

EUV Mask

Multi-Axis Magnetic Lens

Electron Beam Apparatus

Wafer Grounding

Image Quality Enhancement

Critical Dimension Measurement

Energy Filter

Hot Spot Identification

Adaptive Tuning

Ultra High Vacuum System

160 patents: Sort by Forward Citations

1. 10643820 - Apparatus of plural charged-particle beams (2020-05-05),

2. 10468227 - Charged particle source (2019-11-05),

3. 10380731 - Method and system for fast inspecting defects (2019-08-13),

4. 10276347 - Apparatus of plural charged-particle beams (2019-04-30),

5. 10274537 - Test device for defect inspection (2019-04-30),

6. 10236156 - Apparatus of plural charged-particle beams (2019-03-19),

7. 10176967 - Load lock system for charged particle beam imaging (2019-01-08),

8. 10141160 - Apparatus of plural charged-particle beams (2018-11-27),

9. 10115559 - Apparatus of plural charged-particle beams (2018-10-30),

10. 10109456 - Apparatus of plural charged-particle beams (2018-10-23),

11. 10102619 - Inspection method and system (2018-10-16),

12. 10088438 - Method and system for inspecting an EUV mask (2018-10-02),

13. 10062541 - Apparatus of plural charged-particle beams (2018-08-28),

14. 10054556 - Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask (2018-08-21),

15. 10032600 - Charged particle source (2018-07-24),

Hermes Microvision Inc. (HMI), founded in 1996, is a leading supplier of semiconductor inspection and measurement equipment. The company develops and manufactures advanced electron microscopy solutions used for measuring the critical dimensions and structural analysis of semiconductor devices. With its expertise in imaging and analysis, HMI helps semiconductor manufacturers improve the performance and yield of their products. Visit the company's website for more information and product details.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

160 Patents

#48 in Hsinchu

#160 in Taiwan

#5,145 in the World

Hsinchu, Taiwan

Hermes Microvision Inc.

Forward Citations = 1,376

72 inventors:

Zhongwei Chen (51 out of 90 patents)

Jack Jau (43 out of 53 patents)

Weiming Ren (42 out of 102 patents)

4. Wei Fang (28 out of 73 patents)

5. Xuedong Liu (28 out of 87 patents)

Please report any incorrect information to [email protected]

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