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Hsinchu, Taiwan

Hermes Microvision Inc.

USPTO Granted Patents = 160

% Expired Patents = 24.4

EPO Patents = 4

Trademarks = 1

Forward Citations = 1,376

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72 inventors (with patents filed for the assignee):

Zhongwei Chen (51 out of 90 patents)

Jack Jau (43 out of 53 patents)

Weiming Ren (42 out of 103 patents)

4. Wei Fang (28 out of 73 patents)

5. Xuedong Liu (28 out of 88 patents)

6. Shuai Li (23 out of 53 patents)

7. Hong Xiao (21 out of 38 patents)

8. Joe Wang (18 out of 24 patents)

9. Chung-Shih Pan (16 out of 20 patents)

10. Chiyan Kuan (15 out of 22 patents)

11. Zhong-wei Chen (15 out of 50 patents)

12. You-Jin Wang (15 out of 15 patents)

13. Yi-Xiang Wang (13 out of 13 patents)

14. Yan Zhao (12 out of 14 patents)

15. Juying Dou (9 out of 19 patents)

Core Competencies:

Charged Particle Source

Defect Inspection

EUV Mask

Multi-Axis Magnetic Lens

Electron Beam Apparatus

Wafer Grounding

Image Quality Enhancement

Critical Dimension Measurement

Energy Filter

Hot Spot Identification

Adaptive Tuning

Ultra High Vacuum System

160 patents: Sort by Forward Citations

1. 10643820 - Apparatus of plural charged-particle beams (2020-05-05),

2. 10468227 - Charged particle source (2019-11-05),

3. 10380731 - Method and system for fast inspecting defects (2019-08-13),

4. 10276347 - Apparatus of plural charged-particle beams (2019-04-30),

5. 10274537 - Test device for defect inspection (2019-04-30),

6. 10236156 - Apparatus of plural charged-particle beams (2019-03-19),

7. 10176967 - Load lock system for charged particle beam imaging (2019-01-08),

8. 10141160 - Apparatus of plural charged-particle beams (2018-11-27),

9. 10115559 - Apparatus of plural charged-particle beams (2018-10-30),

10. 10109456 - Apparatus of plural charged-particle beams (2018-10-23),

11. 10102619 - Inspection method and system (2018-10-16),

12. 10088438 - Method and system for inspecting an EUV mask (2018-10-02),

13. 10062541 - Apparatus of plural charged-particle beams (2018-08-28),

14. 10054556 - Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask (2018-08-21),

15. 10032600 - Charged particle source (2018-07-24),

Company Overview

Hermes Microvision Inc., based in Hsinchu, Taiwan, specializes in advanced technologies centered around charged particle beams. The company focuses on developing innovative solutions for defect inspection and critical dimension measurement, particularly in the semiconductor industry. Its core technologies include charged particle sources, multi-axis magnetic lenses, and electron beam apparatuses, all aimed at enhancing image quality and ensuring precision in EUV mask applications and wafer grounding processes.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

160 Patents

#48 in Hsinchu

#161 in Taiwan

#5,157 in the World

Hsinchu, Taiwan

Hermes Microvision Inc.

Forward Citations = 1,376

72 inventors:

Zhongwei Chen (51 out of 90 patents)

Jack Jau (43 out of 53 patents)

Weiming Ren (42 out of 103 patents)

4. Wei Fang (28 out of 73 patents)

5. Xuedong Liu (28 out of 88 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Hermes Microvision Inc.. Retrieved from https://idiyas.com/company/hermes-microvision

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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