This inventor holds 90 USPTO granted patents and 5 published patent applications and 6 EPO patents, primarily in Charged Particle Beams (CPC class H01J37-28). Top assignees: Hermes Microvision Inc., Asml Netherlands B.v., Focus E-Beam Technology (Beijing) Co., Ltd.. Active years: 2004-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Inventors with similar research interests:
Company Filing History:
51 out of 160 
34 out of 5,076 
3 out of 15 Years Active: 2004-2025
Areas of Expertise:
Sure, I can help you with that. Here's the article about inventor Zhongwei Chen:
Title: Zhongwei Chen: Pioneering Innovator in Charged Particle Beam Technology
Introduction:
Zhongwei Chen, a distinguished inventor based in San Jose, CA (US), has made significant contributions to the field of charged particle beam technology. With an impressive portfolio of 83 patents, Chen's innovative work has revolutionized the way charged particle flooding is implemented in charged particle beam apparatus.
Latest Patents:
1. Systems and methods for charged particle flooding to enhance voltage contrast defect signal: Chen's patented system and methods enhance voltage contrast defect signals by controlling charged particle beam emission in defocused and focused modes, allowing for improved surface sample analysis.
2. Apparatus of plural charged-particle beams: Chen's multi-beam apparatus increases resolution and throughput by forming parallel images using a single electron source, focusing beamlets onto sample surfaces, and utilizing movable lenses to collimate the primary-electron beam.
Career Highlights:
Chen has demonstrated his expertise while working at renowned companies such as Hermes Microvision Inc. and ASML Netherlands B.V. His innovative solutions have positively impacted the charged particle beam technology landscape, establishing him as a key figure in the industry.
Collaborations:
Throughout his career, Zhongwei Chen has collaborated with talented individuals such as Weiming Ren and Xuedong Liu, fostering a culture of innovation and excellence in his professional endeavors. These collaborations have led to groundbreaking advancements in charged particle beam technology.
Conclusion:
Inventor Zhongwei Chen's groundbreaking work in charged particle beam technology has not only enriched the field but also paved the way for future innovations in surface sample analysis and high-resolution imaging. His dedication to pushing the boundaries of technological possibilities continues to inspire and drive progress in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile