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Seoul, South Korea

Hansol Chemical Co., Ltd.

USPTO Granted Patents = 16

EPO Patents = 3

Forward Citations = 2

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61 inventors (with patents filed for the assignee):

Jung-Woo Park (7 out of 32 patents)

Jang-Hyeon Seok (7 out of 7 patents)

Hyo-Suk Kim (4 out of 4 patents)

4. Jung Park (4 out of 37 patents)

5. Mi-Ra Park (3 out of 3 patents)

6. Eun-Jeong Cho (2 out of 2 patents)

7. Ki-Yeung Mun (2 out of 2 patents)

8. Kyu-Hyun Yeom (2 out of 2 patents)

9. Sungmin Ha (2 out of 2 patents)

10. Seman Kwon (2 out of 2 patents)

11. Soonho Hong (2 out of 2 patents)

12. Hyeonwoo Shim (2 out of 2 patents)

13. Byunghoon Park (2 out of 2 patents)

14. Sunghwan Kang (2 out of 2 patents)

15. Ming-Sung Park (1 out of 1 patent)

16 patents: Sort by Forward Citations

1. 12448550 - Dual-curable adhesive composition (2025-10-21),

2. 12371520 - Copolymer dispersant and dispersion using same (2025-07-29),

3. 12365700 - Group 4 metal element-containing compound, precursor composition including same, and method for manufacturing thin film using same (2025-07-22),

4. 12359317 - Rare earth precursor, method of preparing the same, and method of forming thin film using the same (2025-07-15),

5. 12173210 - Solventless quantum dot composition, method for producing same, and cured film, color filter, and display device comprising same (2024-12-24),

6. 11999756 - Method for producing organometallic compound and thin film fabricated using organometallic compound obtained thereby (2024-06-04),

7. 11967704 - Negative active material for lithium secondary battery, preparing method for the same and lithium secondary battery including the same (2024-04-23),

8. 11942628 - Negative active material for lithium secondary battery, preparing method for the same and lithium secondary battery including the same (2024-03-26),

9. 11495453 - Vapor deposition precursor having excellent thermal stability and reactivity and preparing method therefor (2022-11-08),

10. 11472821 - Precursor compounds for atomic layer deposition (ALD) and chemical vapor deposition (CVD) and ALD/CVD process using the same (2022-10-18),

11. 11414434 - Rare earth precursor, method of manufacturing same and method of forming thin film using same (2022-08-16),

12. 11401290 - Cobalt precursor, method of preparing same and method of manufacturing thin film using same (2022-08-02),

13. 11267828 - Silicon precursor and method of manufacturing silicon-containing thin film using the same (2022-03-08),

14. 11208723 - Organometallic precursor compound for vapor deposition for forming oxide thin film and method for manufacturing same (2021-12-28),

15. 10490409 - Precursor for vapor deposition having excellent thermal stability and preparing method thereof (2019-11-26),

Hansol Chemical Co., Ltd. is a leading chemical company based in South Korea. With a focus on innovation and sustainability, the company offers a wide range of chemical products and services for various industries including electronics, automotive, and construction. Hansol Chemical is committed to delivering high-quality solutions that meet the needs of their customers while minimizing environmental impact.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

16 Patents

#228 in Seoul

#709 in South Korea

#36,671 in the World

Seoul, South Korea

Hansol Chemical Co., Ltd.

Forward Citations = 2

61 inventors:

Jung-Woo Park (7 out of 32 patents)

Jang-Hyeon Seok (7 out of 7 patents)

Hyo-Suk Kim (4 out of 4 patents)

4. Jung Park (4 out of 37 patents)

5. Mi-Ra Park (3 out of 3 patents)

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