The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2022

Filed:

Dec. 27, 2018
Applicant:

Hansol Chemical Co., Ltd., Seoul, KR;

Inventors:

Jung-Woo Park, Seoul, KR;

Jang-Hyeon Seok, Sejong-si, KR;

Hyo-Suk Kim, Jeollabuk-do, KR;

Ming-Sung Park, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 15/06 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 15/06 (2013.01); C23C 16/18 (2013.01); C23C 16/45553 (2013.01);
Abstract

The present invention relates to a vapor deposition compound enabling thin-film deposition through vapor deposition, and more particularly to a novel cobalt precursor, which can be applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and exhibits superior reactivity, volatility and thermal stability, a method of preparing the same and a method of manufacturing a thin film using the same.


Find Patent Forward Citations

Park, Jung-Woo. (2022). Cobalt precursor, method of preparing same and method of manufacturing thin film using same (U.S. Patent No. 11401290). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11401290

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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