The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2022
Filed:
Apr. 27, 2018
Applicant:
Hansol Chemical Co., Ltd., Seoul, KR;
Inventors:
Jung Woo Park, Seoul, KR;
Jang-Hyeon Seok, Sejong-si, KR;
Hyo-Suk Kim, Jeollabuk-do, KR;
Min-Sung Park, Daejeon, KR;
Assignee:
HANSOL CHEMICAL CO., LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/455 (2006.01); C07F 15/04 (2006.01); C07F 15/06 (2006.01); C23C 16/18 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02205 (2013.01); C07F 15/04 (2013.01); C07F 15/06 (2013.01); C23C 16/18 (2013.01); C23C 16/45553 (2013.01); H01L 21/0228 (2013.01); H01L 21/02175 (2013.01);
Abstract
The present invention relates to a vapor deposition compound enabling thin-film deposition through vapor deposition, and particularly to nickel and cobalt precursors capable of being applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and having superior thermal stability and reactivity, and a method of preparing the same.