For the Inventor, By the Inventor

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Irvine, CA, United States of America

Femtometrix, Inc.

USPTO Granted Patents = 20

EPO Patents = 3

Forward Citations = 135

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12 inventors (with patents filed for the assignee):

John Paul Changala (15 out of 16 patents)

Viktor Koldiaev (11 out of 21 patents)

Marc Kryger (11 out of 11 patents)

4. Jianing Shi (7 out of 8 patents)

5. Jeffrey H Hunt (4 out of 166 patents)

6. Ming Lei (3 out of 3 patents)

7. William H Howland (1 out of 20 patents)

8. Seongmin Ma (1 out of 1 patent)

9. Sangmin Kim (1 out of 1 patent)

10. Jonghoi Cho (1 out of 1 patent)

11. Timothy M Wong (1 out of 1 patent)

12. David L Adler (1 out of 1 patent)

13. Marc Christopher Kryger (0 patent)

20 patents: Sort by Forward Citations

1. 12601778 - Field-biased nonlinear optical metrology using corona discharge source (2026-04-14),

2. 12562333 - Method and apparatus for non-invasive, non-intrusive, and un-grounded, simultaneous corona deposition and SHG measurements (2026-02-24),

3. 12553708 - Second-harmonic generation for critical dimensional metrology (2026-02-17),

4. 12510350 - Surface sensing systems and methods for imaging a scanned surface of a sample via sum-frequency vibrational spectroscopy (2025-12-30),

5. 12241924 - Wafer metrology technologies (2025-03-04),

6. 12158492 - Systems and methods for determining characteristics of semiconductor devices (2024-12-03),

7. 11988611 - Systems for parsing material properties from within SHG signals (2024-05-21),

8. 11946863 - Second Harmonic Generation (SHG) optical inspection system designs (2024-04-02),

9. 11821911 - Pump and probe type second harmonic generation metrology (2023-11-21),

10. 11808563 - Surface sensing systems and methods for imaging a scanned surface of a sample via sum-frequency vibrational spectroscopy (2023-11-07),

11. 11473903 - Surface sensing systems and methods for imaging a scanned surface of a sample via sum-frequency vibrational spectroscopy (2022-10-18),

12. 11415617 - Field-biased second harmonic generation metrology (2022-08-16),

13. 11293965 - Wafer metrology technologies (2022-04-05),

14. 11199507 - Systems for parsing material properties from within SHG signals (2021-12-14),

15. 11150287 - Pump and probe type second harmonic generation metrology (2021-10-19),

Femtometrix, Inc. is a technology company based in Irvine, California, specializing in advanced measurement solutions for the semiconductor industry. The company focuses on developing innovative tools and methodologies that enhance the precision of metrology processes, enabling manufacturers to improve yield and performance in semiconductor fabrication. Femtometrix's expertise lies in the intersection of optics and electronics, contributing to the advancement of next-generation technologies in microelectronics.

Profile summary based on public USPTO records.

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USPTO Data Jan 1 1976 - Oct 6 2026

20 Patents

#165 in Irvine, CA

#3,933 in California

#16,382 in US

#31,233 in the World

Irvine, CA, United States of America

Femtometrix, Inc.

Forward Citations = 135

12 inventors:

John Paul Changala (15 out of 16 patents)

Viktor Koldiaev (11 out of 21 patents)

Marc Kryger (11 out of 11 patents)

4. Jianing Shi (7 out of 8 patents)

5. Jeffrey H Hunt (4 out of 166 patents)

Please report any incorrect information to [email protected]

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