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Irvine, CA, United States of America

Femtometrix, Inc.

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USPTO Granted Patents = 20

EPO Patents = 4

Forward Citations = 137

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12 inventors (with patents filed for the assignee):

John Paul Changala (15 out of 16 patents)

Viktor Koldiaev (11 out of 21 patents)

Marc Kryger (11 out of 11 patents)

4. Jianing Shi (7 out of 8 patents)

5. Jeffrey H Hunt (4 out of 167 patents)

6. Ming Lei (3 out of 3 patents)

7. William H Howland (1 out of 20 patents)

8. Seongmin Ma (1 out of 1 patent)

9. Sangmin Kim (1 out of 1 patent)

10. Jonghoi Cho (1 out of 1 patent)

11. Timothy M Wong (1 out of 1 patent)

12. David L Adler (1 out of 1 patent)

13. Marc Christopher Kryger (0 patent)

20 patents: Sort by Forward Citations

1. 12601778 - Field-biased nonlinear optical metrology using corona discharge source (2026-04-14),

2. 12562333 - Method and apparatus for non-invasive, non-intrusive, and un-grounded, simultaneous corona deposition and SHG measurements (2026-02-24),

3. 12553708 - Second-harmonic generation for critical dimensional metrology (2026-02-17),

4. 12510350 - Surface sensing systems and methods for imaging a scanned surface of a sample via sum-frequency vibrational spectroscopy (2025-12-30),

5. 12241924 - Wafer metrology technologies (2025-03-04),

6. 12158492 - Systems and methods for determining characteristics of semiconductor devices (2024-12-03),

7. 11988611 - Systems for parsing material properties from within SHG signals (2024-05-21),

8. 11946863 - Second Harmonic Generation (SHG) optical inspection system designs (2024-04-02),

9. 11821911 - Pump and probe type second harmonic generation metrology (2023-11-21),

10. 11808563 - Surface sensing systems and methods for imaging a scanned surface of a sample via sum-frequency vibrational spectroscopy (2023-11-07),

11. 11473903 - Surface sensing systems and methods for imaging a scanned surface of a sample via sum-frequency vibrational spectroscopy (2022-10-18),

12. 11415617 - Field-biased second harmonic generation metrology (2022-08-16),

13. 11293965 - Wafer metrology technologies (2022-04-05),

14. 11199507 - Systems for parsing material properties from within SHG signals (2021-12-14),

15. 11150287 - Pump and probe type second harmonic generation metrology (2021-10-19),

Company Overview

Femtometrix, Inc. is a technology company based in Irvine, California, specializing in advanced measurement solutions for the semiconductor industry. The company focuses on developing innovative tools and methodologies that enhance the precision of metrology processes, enabling manufacturers to improve yield and performance in semiconductor fabrication. Femtometrix's expertise lies in the intersection of optics and electronics, contributing to the advancement of next-generation technologies in microelectronics.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 27 2026

20 Patents

#165 in Irvine, CA

#3,943 in California

#16,416 in US

#31,315 in the World

Irvine, CA, United States of America

Femtometrix, Inc.

Forward Citations = 137

12 inventors:

John Paul Changala (15 out of 16 patents)

Viktor Koldiaev (11 out of 21 patents)

Marc Kryger (11 out of 11 patents)

4. Jianing Shi (7 out of 8 patents)

5. Jeffrey H Hunt (4 out of 167 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Femtometrix, Inc.. Retrieved from https://idiyas.com/company/femtometrix

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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