This inventor holds 1 USPTO granted patent. Top assignees: Femtometrix, Inc., Skhynix Inc.. Active years: 2026.
Company Filing History:
1 out of 20 
1 out of 11,642 
Years Active: 2026
Title: Seongmin Ma: Innovator in Optical Metrology
Introduction
Seongmin Ma is a notable inventor based in Icheon, South Korea. He has made significant contributions to the field of optical metrology, particularly through his innovative patent that enhances the understanding of semiconductor structures.
Latest Patents
Seongmin Ma holds a patent titled "Field-biased nonlinear optical metrology using corona discharge source." This invention explores various approaches to interrogate surfaces, such as those of layered semiconductor structures on semiconductor wafers. His work incorporates techniques like Second Harmonic Generation and multi-wave mixing, while also utilizing corona discharge to provide additional insights. The patent emphasizes the determination of current flow from samples illuminated with radiation, showcasing a novel method in optical metrology.
Career Highlights
Throughout his career, Seongmin Ma has worked with prominent companies in the technology sector, including SK Hynix Inc. and Femtometrix, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.
Collaborations
Seongmin Ma has collaborated with talented individuals in his field, including Sangmin Kim and Jonghoi Cho. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Seongmin Ma's contributions to optical metrology and semiconductor technology are noteworthy. His innovative patent and collaborations reflect his commitment to advancing the field. His work continues to influence the industry and inspire future innovations.