This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Femtometrix, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: David L. Adler: Innovator in Second-Harmonic Generation Technology
Introduction
David L. Adler is a prominent inventor based in San Jose, California. He has made significant contributions to the field of metrology through his innovative work in second-harmonic generation technology. His expertise and dedication to advancing manufacturing processes have led to the development of a unique patent that enhances device performance and yield.
Latest Patents
David L. Adler holds a patent for "Second-harmonic generation for critical dimensional metrology." This patent describes systems and methods that utilize second-harmonic generation of light to monitor manufacturing processes. The technology is designed to detect changes that can impact the performance or yield of produced devices. The system includes a sample characterization component that directs light onto a sample, generating second harmonic generation (SHG) signals. A detector captures these signals, and a hardware processor analyzes them to determine geometric features or variations in the sample.
Career Highlights
David L. Adler is currently associated with Femtometrix, Inc., where he applies his expertise in metrology and optical technologies. His work focuses on improving manufacturing processes and ensuring high-quality production standards. His innovative approach has positioned him as a key figure in the field of dimensional metrology.
Collaborations
Due to space constraints, the collaborations section has been omitted.
Conclusion
David L. Adler's contributions to second-harmonic generation technology exemplify his commitment to innovation in metrology. His patent and work at Femtometrix, Inc. highlight the importance of advanced manufacturing techniques in enhancing device performance.