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Hawthorne, NY, United States of America

Anvik Corporation

USPTO Granted Patents = 57

% Expired Patents = 31.6

Forward Citations = 1,435

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23 inventors (with patents filed for the assignee):

Kanti Jain (42 out of 55 patents)

Marc I Zemel (13 out of 16 patents)

Nestor O Farmiga (10 out of 30 patents)

4. Carl C Kling (10 out of 11 patents)

5. Thomas J Dunn (9 out of 16 patents)

6. Marc A Klosner (7 out of 7 patents)

7. Sivarama K Kuchibhotla (5 out of 5 patents)

8. Jeffrey M Hoffman (4 out of 5 patents)

9. Leszek Wojcik (3 out of 3 patents)

10. William C Sweatt (2 out of 49 patents)

11. Robert S Sposili (2 out of 19 patents)

12. Shyam Raghunandan (2 out of 2 patents)

13. Junghun Chae (1 out of 3 patents)

14. Sreeram Appasamy (1 out of 1 patent)

15. Diwakar Kedlaya (1 out of 1 patent)

Core Competencies:

Pulsed Laser Source

Dual-Mode Patterning

Illumination Compensator

Spatial Light Modulator

Photonic-Electronic Circuit Boards

Microlithography System

Projection Lithography

Energy-Recycling Exposure System

High-Throughput Processing

Flexible Substrates

Anti-Glare Vehicle Mirror

Ultraviolet-Based Scanning

57 patents: Sort by Forward Citations

1. 8687662 - Pulsed laser source with high repetition rate (2014-04-01),

2. 8467424 - Pulsed laser source with high repetition rate (2013-06-18),

3. 8420978 - High throughput, low cost dual-mode patterning method for large area substrates (2013-04-16),

4. 7795559 - Vacuum debris removal system (2010-09-14),

5. 7670727 - Illumination compensator for curved surface lithography (2010-03-02),

6. 7420730 - Spatial light modulator features (2008-09-02),

7. 7390116 - High-brightness, compact illuminator with integrated optical elements (2008-06-24),

8. 7226542 - Fluid treatment apparatus (2007-06-05),

9. 7195375 - Compact, high-efficiency, energy-recycling illumination system (2007-03-27),

10. 7170669 - Spatial light modulator array with heat minimization and image enhancement features (2007-01-30),

11. 7164465 - Versatile maskless lithography system with multiple resolutions (2007-01-16),

12. 7158305 - Illumination system optimized for throughput and manufacturability (2007-01-02),

13. 7139448 - Photonic-electronic circuit boards (2006-11-21),

14. 7106415 - Illumination compensator for curved surface lithography (2006-09-12),

15. 6903808 - Alignable low-profile substrate chuck for large-area projection lithography (2005-06-07),

Anvik Corporation, based in Hawthorne, NY, specializes in advanced maskless lithography technologies. The company focuses on developing innovative solutions such as pulsed laser sources, dual-mode patterning, and illumination compensators, which enhance precision in microfabrication processes. Anvik's expertise extends to spatial light modulators and photonic-electronic circuit boards, positioning it at the forefront of microlithography systems and projection lithography. Their commitment to energy-recycling exposure systems reflects a dedication to sustainable manufacturing practices.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

Anvik Corporation

57 Patents

#1 in Hawthorne, NY

#379 in New York

#6,244 in US

#12,552 in the World

Hawthorne, NY, United States of America

Anvik Corporation

Forward Citations = 1,435

23 inventors:

Kanti Jain (42 out of 55 patents)

Marc I Zemel (13 out of 16 patents)

Nestor O Farmiga (10 out of 30 patents)

4. Carl C Kling (10 out of 11 patents)

5. Thomas J Dunn (9 out of 16 patents)

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