This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Anvik Corporation. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Diwakar Kedlaya: Innovator in Vacuum Debris Removal Systems
Introduction
Diwakar Kedlaya is a notable inventor based in Yonkers, NY (US). He has made significant contributions to the field of vacuum debris removal systems, showcasing his innovative spirit and technical expertise. His work is particularly relevant in applications involving photoablation, where precision and efficiency are paramount.
Latest Patents
Diwakar Kedlaya holds a patent for a "Vacuum Debris Removal System." This invention features a turbulence-controlled vacuum debris removal subsystem that safely exhausts particles ejected during photoablation. The system employs nested interconnected chambers that provide diminishing sweeping gas partial pressure and turbulence, effectively ejecting particles from the ablation beam path between pulses. The removal rate is influenced by conductance and particle sizes, with metering holes enabling optimization of partial pressure differentials. This controlled flow reduces turbulence in the mixture of debris and sweeping gases, ensuring a clear light path and effective containment of particulate matter.
Career Highlights
Kedlaya's career is marked by his role at Anvik Corporation, where he has been instrumental in developing innovative solutions for complex challenges. His expertise in vacuum systems and particle management has positioned him as a key player in his field.
Collaborations
Throughout his career, Diwakar has collaborated with talented individuals such as Leszek Wojcik and Kanti Jain. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Diwakar Kedlaya's contributions to vacuum debris removal systems exemplify his commitment to innovation and excellence. His patent reflects a deep understanding of the challenges in photoablation processes and offers practical solutions to enhance efficiency and safety.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
