Company Filing History:
Years Active: 2001-2010
Title: Innovations of Marc A Klosner
Introduction
Marc A Klosner is a notable inventor based in White Plains, NY (US), recognized for his contributions to the field of lithography. He holds a total of seven patents, showcasing his innovative spirit and technical expertise. His work primarily focuses on enhancing the capabilities of lithography systems, which are crucial in the manufacturing of microelectronics.
Latest Patents
Among his latest patents is the "Illumination compensator for curved surface lithography." This invention features a zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path. It serves as a curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair allows the beam to diffract as efficiently as a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This innovative optics device is expected to overcome several barriers for curved mask projection lithography and find applications in other areas where collimated or converging light beams must travel extra paths without significant aberration.
Another significant patent is the "Versatile maskless lithography system with multiple resolutions." This system offers a maskless patterning capability with the ability to rapidly select among various projection lenses mounted on a turret. This feature enables the optimization of imaging resolution and exposure throughput, making it possible to fabricate microelectronics packaging products cost-effectively. A preferred embodiment of this invention utilizes a digital micromirror device array spatial light modulator as a virtual mask, while another embodiment employs multiple closely spaced digital micromirror device arrays to enhance throughput.
Career Highlights
Marc A Klosner is currently associated with Anvik Corporation, where he continues to push the boundaries of lithography technology. His work has significantly impacted the efficiency and effectiveness of microelectronics manufacturing processes.
Collaborations
Throughout his career, Klosner has collaborated with notable colleagues, including Kanti Jain and Marc I Zemel. These collaborations have contributed to the advancement of innovative solutions in the field of lithography.
Conclusion
Marc A Klosner's contributions to lithography through his patents and innovative designs have positioned him as a key figure in the industry. His work not only addresses current challenges but also paves the way for future advancements in microelectronics manufacturing.