New York, NY, United States of America

Robert S Sposili

USPTO Granted Patents = 19 

Average Co-Inventor Count = 3.0

ph-index = 10

Forward Citations = 595(Granted Patents)


Location History:

  • Portland, OR (US) (2005 - 2009)
  • New York, NY (US) (2003 - 2014)

Company Filing History:


Years Active: 2003-2014

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19 patents (USPTO):Explore Patents

Title: Innovations of Robert S. Sposili in Thin Film Semiconductor Technology

Introduction

Robert S. Sposili, a prominent inventor based in New York, NY, has made significant contributions to the field of thin film semiconductor technology. With a total of 19 patents to his name, his groundbreaking work is shaping the future of semiconductor devices. His innovative methodologies and inventions are paving the way for advancements in electronic applications.

Latest Patents

Among his latest patents, Sposili has developed a notable technology involving "Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon." This patent elaborates on methods for processing an amorphous silicon thin film sample into a polycrystalline silicon thin film. In this inventive process, Sposili describes generating a sequence of excimer laser pulses, modulating each pulse to a predetermined fluence, and employing a two-dimensional pattern of slits to create fluence-controlled beamlets. The technique involves irradiating the amorphous silicon sample in a manner that promotes the melting of specific portions, thus facilitating the transformation into a high-quality polycrystalline silicon thin film.

Another key aspect of Sposili's innovation is the creation of a device comprising two or more rectangular crystalline regions, each formed from single crystal regions. This advanced device includes thin-film transistors with active-channel regions derived from these crystalline segments, ultimately integrating an efficient semiconductor circuit designed for high performance.

Career Highlights

Robert S. Sposili has cultivated a career marked by collaboration and innovation. His tenure at institutions like Columbia University and Sharp Laboratories of America, Inc. has enabled him to refine his skills and knowledge in materials science and semiconductor technology. These experiences have directly influenced his inventive work, leading to his numerous patents.

Collaborations

Throughout his career, Sposili has collaborated with notable colleagues such as Mark Albert Crowder and James S. Im. These partnerships have enriched his projects and have been vital in bringing complex ideas to fruition. The collective expertise within these collaborations reflects the interdisciplinary nature of innovation in the field of semiconductor technology.

Conclusion

In conclusion, Robert S. Sposili's innovative contributions to the arena of thin film semiconductors represent a remarkable intersection of creativity and technology. With 19 patents and a career underscored by significant collaborations, Sposili is a driving force in the ongoing evolution of semiconductor devices and technologies. His work illustrates a vibrant blend of scientific inquiry and practical application, ensuring that the developments in this domain will continue to advance.

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