Champaign, IL, United States of America

Junghun Chae

This inventor holds 3 USPTO granted patents. Top assignees: University of Illinois, Anvik Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junghun Chae. Retrieved from https://idiyas.com/inventor/junghun-chae

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2013

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3 patents (USPTO):Explore Patents

Title: Junghun Chae: Innovator in Photolithography and Material Processing

Introduction

Junghun Chae is a notable inventor based in Champaign, IL (US), recognized for his contributions to the fields of photolithography and material processing. With a total of 3 patents, Chae has made significant advancements that enhance the functionality and efficiency of electronic and optical devices.

Latest Patents

Chae's latest patents include innovations such as "Mirror arrays for maskless photolithography and image display." This invention features micromirrors and micromirror arrays that are particularly useful in maskless photolithography systems and projection display devices. The micromirrors consist of a polymer structural layer and a reflective dielectric multilayer, which allows for selective reflection and redirection of incoming electromagnetic radiation. This design not only enhances performance but also prevents damage to polymer materials from excessive heating. Another significant patent is related to "Material assisted laser ablation," which provides advanced photoablation-based processing techniques. This invention enables high-resolution patterning and integration of materials for various electronic, optical, and opto-electronic devices, including integrated circuits and biomedical devices.

Career Highlights

Throughout his career, Junghun Chae has worked with esteemed organizations such as the University of Illinois and Anvik Corporation. His work in these institutions has allowed him to develop and refine his innovative ideas, contributing to the advancement of technology in his field.

Collaborations

Chae has collaborated with notable colleagues, including Kanti Jain and Sreeram Appasamy. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Junghun Chae's contributions to photolithography and material processing exemplify the spirit of innovation. His patents reflect a commitment to enhancing technology and improving device functionality. Through his work, Chae continues to influence the fields of electronics and optics significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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