Mohegan Lake, NY, United States of America

Thomas J Dunn


Average Co-Inventor Count = 2.3

ph-index = 10

Forward Citations = 408(Granted Patents)


Location History:

  • Avon, MA (US) (1990 - 1992)
  • Orlando, FL (US) (1991 - 1992)
  • Mohegan Lake, NY (US) (1996 - 2001)

Company Filing History:


Years Active: 1990-2001

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16 patents (USPTO):Explore Patents

Title: Innovations of Thomas J Dunn

Introduction

Thomas J Dunn is a notable inventor based in Mohegan Lake, NY (US), recognized for his significant contributions to the field of lithography. With a total of 16 patents to his name, Dunn has developed groundbreaking technologies that enhance manufacturing processes and improve precision in patterning.

Latest Patents

One of his latest inventions is a seamless, maskless lithography system using a spatial light modulator. This innovative system eliminates the need for masks by utilizing a programmable Spatial Light Modulator (SLM) with high parallel processing power. By illuminating the SLM with a radiation source, which can be a pulsed laser or a shuttered lamp, Dunn's invention provides a patterning image of many pixels onto a substrate. The preferred SLM is a Deformable Micromirror Device, allowing for reflective pixel selection, while an alternative option is a Liquid Crystal Light Valve for pass-through pixel selection. This invention enables seamless scanning and is suitable for rapid prototyping and flexible manufacturing.

Another significant patent is a microlithography system designed for high-resolution large-area patterning on curved surfaces. This system can pattern large, curved substrates at high exposure speeds and any desired image resolution. The substrate is held on a scanning stage, where a stationary projection subsystem images the mask onto the substrate. The system includes mechanisms for dynamically sensing substrate height and ensuring that the exposed region remains within the depth of focus of the projection subsystem.

Career Highlights

Throughout his career, Thomas J Dunn has worked with various companies, including Anvik Corporation. His work has significantly impacted the field of lithography, leading to advancements in manufacturing technologies.

Collaborations

Dunn has collaborated with notable individuals such as Kanti Jain and Nestor O Farmiga, contributing to the development of innovative technologies in his field.

Conclusion

Thomas J Dunn's contributions to lithography through his patents and collaborations have established him as a prominent figure in the field of innovation. His work continues to influence advancements in manufacturing and technology.

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