The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Dec. 21, 2007
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanevsky, Haifa, IL;
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael Adel, Zichron Ya'akov, IL;
Anatoly Fabrikant, Fremont, CA (US);
Christopher F. Bevis, Los Gatos, CA (US);
John Fielden, Los Altos, CA (US);
Noah Bareket, Saratoga, CA (US);
Ken Gross, San Carlos, CA (US);
Piotr Zalicki, Sunnyvale, CA (US);
Dan Wack, Los Altos, CA (US);
Paola Dececco, Redwood City, CA (US);
Thaddeus G. Dziura, San Jose, CA (US);
Mark Ghinovker, Migdal Ha'Emek, IL;
Walter D. Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Boris Golovanevsky, Haifa, IL;
Michael Friedmann, Mountain View, CA (US);
Ian Smith, Los Gatos, CA (US);
Michael Adel, Zichron Ya'akov, IL;
Anatoly Fabrikant, Fremont, CA (US);
Christopher F. Bevis, Los Gatos, CA (US);
John Fielden, Los Altos, CA (US);
Noah Bareket, Saratoga, CA (US);
Ken Gross, San Carlos, CA (US);
Piotr Zalicki, Sunnyvale, CA (US);
Dan Wack, Los Altos, CA (US);
Paola Dececco, Redwood City, CA (US);
Thaddeus G. Dziura, San Jose, CA (US);
Mark Ghinovker, Migdal Ha'Emek, IL;
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb; target C is designed to have an offset Xc; and target D is designed to have an offset Xd. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra S, S, S, and Sfrom targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra S, S, S, and S.