San Jose, CA, United States of America

Thaddeus Gerard Dziura

This inventor holds 33 USPTO granted patents and 2 published patent applications and 3 EPO patents, primarily in X-Ray Metrology. Top assignees: Kla Tencor Corporation, Kla Corporation, Kla-Tencor Technologies Corporation. Active years: 2008-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thaddeus Gerard Dziura. Retrieved from https://idiyas.com/inventor/thaddeus-gerard-dziura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33 

% Patents Active = 90.9

 

Average Co-Inventor Count = 3.8

ph-index = 11

Forward Citations = 378(Granted Patents)


Company Filing History:


Years Active: 2008-2025

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Areas of Expertise:
X-Ray Scatterometry
Optical Metrology
Patterned Wafer Characterization
High Aspect Ratio Structures
Optical Critical Dimension
Parameter Tracking
Measurement Techniques
3D Semiconductor Structures
Overlay Error Detection
Metrology System Optimization
Deep Structure Monitoring
33 patents (USPTO):Explore Patents

Title: Thaddeus Gerard Dziura: Innovator in Semiconductor Technology

Introduction

Thaddeus Gerard Dziura, based in San Jose, CA, is a prominent inventor known for his contributions to semiconductor technology. With an impressive portfolio of 31 patents, Dziura has made significant advancements in process monitoring and characterization techniques in the semiconductor fabrication process.

Latest Patents

Among Dziura's latest innovations are two noteworthy patents focused on X-ray scatterometry. The first patent, titled "Process Monitoring of Deep Structures with X-ray Scatterometry," discusses methods and systems designed to estimate values of process and structural parameters. This innovation allows for quick and accurate X-ray scatterometry measurements at different stages of semiconductor fabrication, aimed at improving yield in ongoing processes by enabling real-time corrections based on measured data.

The second patent, "Full Beam Metrology for X-ray Scatterometry Systems," outlines a method for characterizing dimensions and material properties of semiconductor devices using a full beam X-ray scatterometry approach. This system includes advancements in photon counting detectors and improvements in measurement accuracy and throughput. By simultaneously measuring the direct beam and scattered orders, Dziura’s system optimizes the measurement process while minimizing errors.

Career Highlights

Dziura's career has seen him contribute to several prestigious companies, including Kla Tencor Corporation and Kla-Tencor Technologies Corporation. His work within these organizations has paved the way for innovative solutions in semiconductor manufacturing, particularly focusing on enhancing measurement capabilities and process controls.

Collaborations

Throughout his career, Thaddeus Gerard Dziura has collaborated with renowned professionals such as Andrei V Shchegrov and Antonio Arion Gellineau. These collaborations have further enriched his understanding of semiconductor technologies and fostered the development of cutting-edge inventions leading to improved semiconductor processes.

Conclusion

Thaddeus Gerard Dziura stands out as a key figure in the realm of semiconductor technology, with his 31 patents enhancing various aspects of fabrication and monitoring processes. His influential work continues to drive progress in the industry, exemplifying innovation and excellence in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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