The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Feb. 01, 2024
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Daniel James Haxton, Fremont, CA (US);

Christopher Liman, San Jose, CA (US);

Inkyo Kim, Cupertino, CA (US);

Boxue Chen, San Jose, CA (US);

Hyowon Park, Milpitas, CA (US);

Thaddeus Gerard Dziura, San Jose, CA (US);

Nakyoon Kim, Hwaseong-si, KR;

Houssam Chouaib, Milpitas, CA (US);

Anderson Chou, Hillsboro, OR (US);

Dimitry Sanko, Vallejo, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20 (2018.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20 (2013.01); G01N 21/9501 (2013.01);
Abstract

Methods and systems for determining random variation in one or more structures on a specimen are provided. One method includes determining characteristic(s) of output generated by an output acquisition subsystem for structure(s) formed on a specimen and simulating the characteristic(s) of the output with initial parameter values for the structure(s). The method also includes determining parameter values of the structure(s) formed on the specimen as the initial parameter values that resulted in the simulated characteristic(s) that best match the determined characteristic(s). The determined parameter values are responsive to random variation in parameter(s) of the structure(s) on the specimen.


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