Company Filing History:
Years Active: 2016-2025
Title: Innovations of Inkyo Kim in Semiconductor Metrology
Introduction
Inkyo Kim is a notable inventor based in Cupertino, CA, with a focus on optical and X-ray metrology methods for semiconductor structures. He holds a total of 3 patents that contribute significantly to advancements in the field of semiconductor technology.
Latest Patents
One of his latest patents is titled "Optical and X-ray metrology methods for patterned semiconductor structures with randomness." This patent provides methods and systems for determining random variation in structures on a specimen. The method involves determining characteristics of output generated by an output acquisition subsystem for structures formed on a specimen and simulating these characteristics with initial parameter values. The goal is to determine parameter values that best match the determined characteristics, which are responsive to random variations in the structures.
Another significant patent is "Automatic selection of sample values for optical metrology." This invention includes a method for providing a library parameter space for modeling a diffracting structure using an optical metrology system. It involves automatically determining a reduced sampling set from the library parameter space, based on recommendations for sampling shapes or filters. This innovation enhances the efficiency of optical metrology systems.
Career Highlights
Inkyo Kim has worked with prominent companies in the semiconductor industry, including Kla Corporation and KLA-Tencor Corporation. His experience in these organizations has allowed him to develop and refine his expertise in metrology and semiconductor technologies.
Collaborations
Throughout his career, Inkyo has collaborated with notable colleagues such as Leonid Poslavsky and Thaddeus Gerard Dziura. These collaborations have likely contributed to the innovative advancements in his patents and research.
Conclusion
Inkyo Kim's contributions to semiconductor metrology through his patents and career experiences highlight his significant role in advancing technology in this field. His work continues to influence the development of more efficient and accurate metrology methods.