The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Oct. 31, 2012
Kla-tencor Corporation, Milpitas, IA (US);
Sungchul Yoo, Campbell, CA (US);
Andrei V. Shchegrov, Campbell, CA (US);
Thaddeus G. Dziura, San Jose, CA (US);
InKyo Kim, Cupertino, CA (US);
SeungHwan Lee, Suwon-si, KR;
ByeoungSu Hwang, Milpitas, CA (US);
Leonid Poslavsky, Belmont, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into a scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.