The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
Nov. 15, 2014
Meng Cao, Union City, CA (US);
Leonid Poslavsky, Belmont, CA (US);
Inkyo Kim, Cupertino, CA (US);
Lie-quan Lee, Fremont, CA (US);
Meng Cao, Union City, CA (US);
Leonid Poslavsky, Belmont, CA (US);
Inkyo Kim, Cupertino, CA (US);
Lie-Quan Lee, Fremont, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
Embodiments include automatic selection of sample values for optical metrology. An embodiment of a method includes providing a library parameter space for modeling of a diffracting structure using an optical metrology system; automatically determining by a processing unit a reduced sampling set from the library parameter space, wherein the reduced space is based on one or both of the following recommending a sampling shape based on an expected sample space usage, or recommending a sampling filter based on correlation between two or more parameters of the library parameter space; and generating a library for the optical metrology system using the reduced sampling set.