Lie-Quan Lee

This inventor holds 12 USPTO granted patents and 2 published patent applications. Top assignees: Kla Tencor Corporation, Kla Corporation, Tokyo Electron Limited. Active years: 2013-2023.

USPTO Granted Patents = 12 (Patent Applications = 2)

% Patents Active = 100.0

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 29(Granted Patents)

Company Filing History:

9 out of 1,787

Kla Tencor Corporation

Tokyo Electron Limited

patents

where one patent can have more than one assignee

Years Active: 2013-2023

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11562289 - Loosely-coupled inspection and metrology system for high-volume production process monitoring (2023-01-24),

2. 11175589 - Automatic wavelength or angle pruning for optical metrology (2021-11-16),

3. 10895810 - Automatic selection of sample values for optical metrology (2021-01-19),

4. 10732520 - Measurement library optimization in semiconductor metrology (2020-08-04),

5. 10502692 - Automated metrology system selection (2019-12-10),

6. 10386729 - Dynamic removal of correlation of highly correlated parameters for optical metrology (2019-08-20),

7. 10345721 - Measurement library optimization in semiconductor metrology (2019-07-09),

8. 10255385 - Model optimization approach based on spectral sensitivity (2019-04-09),

9. 9607265 - Accurate and fast neural network training for library-based critical dimension (CD) metrology (2017-03-28),

10. 9553033 - Semiconductor device models including re-usable sub-structures (2017-01-24),

11. 9347872 - Meta-model based measurement refinement (2016-05-24),

12. 8577820 - Accurate and fast neural network training for library-based critical dimension (CD) metrology (2013-11-05),

Title: Innovations of Inventor Lie-Quan Lee

Introduction

Lie-Quan Lee is a prominent inventor based in Fremont, California, known for his significant contributions to the field of metrology and inspection systems. With a total of 12 patents to his name, he has made remarkable advancements that enhance high-volume production processes.

Latest Patents

Among his latest patents is the "Loosely-coupled inspection and metrology system for high-volume production process monitoring." This innovative metrology system includes a controller that is communicatively coupled to both a reference metrology tool and an optical metrology tool. The controller is equipped with processors that generate geometric and material models to determine profiles and material parameters of test structures. Another notable patent is "Automatic wavelength or angle pruning for optical metrology." This method involves creating a model of a structure, analyzing a dataset for outliers, and modifying the dataset to improve accuracy in optical metrology.

Career Highlights

Lie-Quan Lee has worked with notable companies such as KLA-Tencor Corporation and KLA Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in metrology and inspection technologies.

Collaborations

Lie-Quan has collaborated with esteemed colleagues, including Leonid Poslavsky and Meng Cao, contributing to the advancement of metrology systems.

Conclusion

Lie-Quan Lee's work in the field of metrology has led to significant innovations that improve production processes. His patents reflect a deep understanding of optical metrology and inspection systems, showcasing his expertise and commitment to advancing technology.