Company Filing History:
Years Active: 2025
Title: Innovations by Daniel James Haxton
Introduction
Daniel James Haxton is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced metrology methods that enhance the measurement and optimization of semiconductor structures.
Latest Patents
Haxton's latest patents include innovative methods for optical and X-ray metrology. One of his patents, titled "Optical and X-ray metrology methods for patterned semiconductor structures with randomness," provides systems for determining random variations in structures on a specimen. This method involves simulating output characteristics generated by an acquisition subsystem and determining parameter values that best match the observed characteristics.
Another notable patent is "Methods and systems for measurement of semiconductor structures with multi-pass statistical optimization." This patent describes a process for measuring physical properties of a specimen through iterative optimization, utilizing both current and prior measurement information. The approach employs a Maximum A Posteriori (MAP) estimation to integrate various data sources, enhancing the accuracy of semiconductor measurements.
Career Highlights
Haxton is currently employed at Kla Corporation, where he continues to develop cutting-edge technologies in semiconductor measurement. His expertise in metrology has positioned him as a key player in the industry, contributing to advancements that improve the reliability and efficiency of semiconductor manufacturing.
Collaborations
Throughout his career, Haxton has collaborated with notable colleagues, including John Josef Hench and Christopher Liman. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Daniel James Haxton's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in metrology, ensuring the precision and reliability of semiconductor structures.