Walter Dean Mieher

Title: Walter Dean Mieher: Pioneering Innovations in Overlay Error Detection and Focus Determination

Introduction:

Walter Dean Mieher, a renowned inventor and engineer based in Los Gatos, California, has made substantial contributions to the field of semiconductor technology. With an impressive portfolio of 43 patents, Mieher has played a vital role in developing groundbreaking techniques for overlay error detection and focus determination. Let us delve into his latest inventions, career highlights, and notable collaborations.

Latest Patents:

One of Mieher's notable patents is the "Apparatus and methods for detecting overlay errors using scatterometry." This invention proposes a novel method for determining overlay errors between different layers in a multiple layer sample. By using an imaging optical system and scatterometry overlay technique, this invention enables the analysis of measured optical signals from periodic targets, ultimately determining the overlay error between these targets.

Another notable invention by Mieher is the "System and method for focus determination using focus-sensitive overlay targets." This patent presents a lithography mask with asymmetric segmented pattern elements. By analyzing the position of the unsegmented pattern image generated on the sample, this innovative method enables accurate focus determination along the optical axis of the projection optics.

Career Highlights:

Throughout his exceptional career, Mieher has made significant contributions to the field of semiconductor technology. His expertise lies in developing advanced techniques to improve the precision and efficiency of semiconductor manufacturing processes.

Mieher has been associated with esteemed companies such as KLA-Tencor Technologies Corporation (now KLA Corporation) and KLA-Tencor Corporation. His role in these companies involved research and development to enhance semiconductor metrology solutions. These collaborations have given Mieher valuable exposure to cutting-edge technologies and the opportunity to work alongside industry leaders.

Collaborations:

An individual's success is often shaped by their professional collaborations, and Mieher is no exception. During his career, Mieher has had the privilege of working with talented colleagues, including Ady Levy and Michael E Adel. Collaboration with these accomplished professionals has enriched Mieher's ability to tackle complex challenges in the field of semiconductor technology.

Conclusion:

Walter Dean Mieher's extensive patent portfolio and groundbreaking inventions in overlay error detection and focus determination have established him as a leading innovator in the field of semiconductor technology. Through his work with renowned companies and collaborations with talented colleagues, Mieher has consistently pushed the boundaries of innovation. His contributions have undoubtedly played a crucial role in advancing the semiconductor industry and transforming the way we approach manufacturing processes.