Yung-chen Lin

Title: Yung-chen Lin: Innovator in Boron Film Deposition and Metal Etching Technologies

Introduction

Yung-chen Lin is a prominent inventor based in Gardena, California, known for his significant contributions to the field of materials science and semiconductor technology. With a total of 16 patents to his name, Lin has developed innovative methods that enhance the efficiency and effectiveness of various manufacturing processes.

Latest Patents

Among his latest patents, Lin has introduced methods for the deposition of boron films. These methods involve exposing a substrate to a boron precursor and a plasma, resulting in the formation of boron-containing films such as elemental boron, boron oxide, boron carbide, boron silicide, and boron nitride. The unique aspect of this technology is the selective deposition of these films on specific materials, such as silicon nitride or silicon, while avoiding deposition on others like silicon oxide.

Another notable patent is the two-dimensional self-aligned scheme with subtractive metal etch. This method is designed for the formation of a layer stack during the back-end-of-line (BEOL) process flow. It utilizes a hard mask to create a via that connects two metal layers, allowing for the efficient patterning of features within the stack.

Career Highlights

Throughout his career, Yung-chen Lin has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. and Micro Materials Inc. His expertise in materials science has made him a valuable asset in these organizations, where he has contributed to the advancement of innovative technologies.

Collaborations

Lin has collaborated with notable professionals in his field, including Ying Di Zhang and Qingjun Zhou. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Yung-chen Lin's work in the deposition of boron films and metal etching techniques showcases his innovative spirit and dedication to advancing semiconductor technology. His contributions continue to influence the industry and pave the way for future innovations.