IDiyas

For the Inventor, By the Inventor

Albany, NY, United States of America

Yun Han

USPTO Granted Patents = 19 

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:

goldMedal19 out of 10,295 
 
Tokyo Electron Limited
 patents

Years Active: 2021-2025

where 'Filed Patents' based on already Granted Patents

19 patents (USPTO):
1. 12451329 - Plasma processing apparatus with tunable electrical characteristic (2025-10-21),
2. 12400872 - Sacrificial capping layer for gate protection (2025-08-26),
3. 12341009 - Variable hardness amorphous carbon mask (2025-06-24),
4. 12300500 - Etching of polycrystalline semiconductors (2025-05-13),
5. 12288692 - Method of forming a FET structure by selective deposition of film on source/drain contact (2025-04-29),
6. 12266533 - Sacrificial capping layer for contact etch (2025-04-01),
7. 12237216 - Method for filling recessed features in semiconductor devices with a low-resistivity metal (2025-02-25),
8. 12189297 - Methods for extreme ultraviolet (EUV) resist patterning development (2025-01-07),
9. 12040176 - Technologies for high aspect ratio carbon etching with inserted charge dissipation layer (2024-07-16),
10. 11961735 - Cyclic plasma processing (2024-04-16),
11. 11942307 - Plasma processing with radio frequency (RF) source and bias signal waveforms (2024-03-26),
12. 11651967 - Non-atomic layer deposition (ALD) method of forming sidewall passivation layer during high aspect ratio carbon layer etch (2023-05-16),
13. 11605539 - Defect correction on metal resists (2023-03-14),
14. 11532517 - Localized etch stop layer (2022-12-20),
15. 11527413 - Cyclic plasma etch process (2022-12-13),

Title: Innovations by Yun Han: Pioneering Patents in Semiconductor Processing

Introduction

Yun Han is a distinguished inventor based in Albany, NY, whose work has significantly contributed to advancements in semiconductor technology. With a remarkable portfolio of 17 patents, she stands out as a leading figure in developing innovative methods for semiconductor processing.

Latest Patents

Yun Han's most notable recent patents include a groundbreaking method for creating a variable hardness amorphous carbon mask. This innovation involves fabricating an amorphous carbon layer (ACL) mask that consists of both soft and hard portions, allowing for a seamless transition in hardness. The soft ACL portion supports the hard ACL portion, facilitating precise etching while exposing the underlying layer.

Another significant patent from Yun Han involves the etching of polycrystalline semiconductors. This method includes a cyclic plasma etching process that enhances the precision in extending recesses on substrates covered with oxide layers and polycrystalline semiconductor materials. By employing different plasmas throughout the process, she has optimized etching conditions that yield superior results.

Career Highlights

Yun Han is currently employed at Tokyo Electron Limited, a prominent player in the semiconductor manufacturing equipment industry. Her expertise in innovative processing methods positions her as a key asset in her company, driving technological advancements in the field.

Collaborations

Throughout her career, Yun Han has collaborated with esteemed colleagues, including Alok Ranjan and Peter Ventzek. These partnerships have fostered a rich environment for creativity and support in her research endeavors, contributing to the successful development of her patents.

Conclusion

Yun Han's contributions to the realm of semiconductor technology through her inventive patents underscore her dedication and expertise. As she continues to push the boundaries of innovation, her work will play a vital role in shaping the future of semiconductor processing and related industries.

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