The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Mar. 11, 2024
Tokyo Electron Limited, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of etching a target material exposed on a substrate that also includes a reservation material exposed on the substrate includes exposing both the target material and the reservation material to an oxygen source to selectively form oxide on the reservation material relative to the target material, and etching the target material using an etchant gas. The oxide on the reservation material slows an effective etch rate of the reservation material relative to an effective etch rate of the target material. The reservation material may have a similar or different material composition than the target material. The target material may be exposed in a first subset of recesses with a first aspect ratio and while the reservation material may be exposed in a second set of the recesses with a second aspect ratio higher than the first aspect ratio.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile