Na Li

Title: Na Li: Semiconductor Process Innovation at Tokyo Electron Limited.

Introduction

Na Li is an inventor associated with Albany, New York, and Tokyo Electron Limited. His patent work addresses selective etching processes used in semiconductor manufacturing.

Latest Patents

One patent is listed for Na Li: In Situ Etch Rate Differentiation Through Oxidation. The invention describes exposing target and reservation materials on a substrate to an oxygen source, selectively forming oxide on the reservation material, and then etching the target material with an etchant gas. The oxide slows the reservation material’s effective etch rate relative to the target material’s rate. The materials may have similar or different compositions, and the method can be applied to recesses with different aspect ratios. The patent record provided lists 1 patent.

Career Highlights

Li’s listed invention concerns controlling relative etch rates through selective oxidation, a process approach relevant to precision patterning in semiconductor fabrication. He is associated with Tokyo Electron Limited, a company that develops semiconductor production equipment.

Collaborations

Li’s coworker Yun Han is identified as a collaborator. The information provided does not specify her role in the patent or the nature of their collaboration.

Conclusion

Na Li’s listed patent presents a selective oxidation technique for differentiating etch rates, highlighting his contribution to semiconductor process innovation at Tokyo Electron Limited.