Yueh-Chin Lin

Title: Innovations of Yueh-Chin Lin in Semiconductor Manufacturing

Introduction

Yueh-Chin Lin is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 11 patents. His work focuses on innovative methods that enhance the efficiency and performance of semiconductor devices.

Latest Patents

Yueh-Chin Lin's latest patents include a method of manufacturing a semiconductor device. This method involves providing a substrate, forming a channel layer on the substrate, and creating a barrier layer on the channel layer. Additionally, a source and a drain are formed on the barrier layer, and a recess is created in the barrier layer. The process includes forming a first dielectric layer to cover the bottom surface of the recess, followed by a charge trapping layer and a first ferroelectric material layer. A second dielectric layer and a second ferroelectric material layer are then formed, culminating in the creation of a gate over the second ferroelectric material layer. Another patent describes a semiconductor device that includes a substrate, a channel layer, a barrier layer, and a ferroelectric composite material layer, all arranged in a specific sequence to optimize performance.

Career Highlights

Yueh-Chin Lin is affiliated with National Yang Ming Chiao Tung University, where he continues to advance research in semiconductor technology. His innovative approaches have garnered attention in the academic and industrial sectors, contributing to the development of next-generation semiconductor devices.

Collaborations

Yueh-Chin Lin has collaborated with notable colleagues, including Edward Yi Chang and Yi Chang, who have contributed to his research endeavors.

Conclusion

Yueh-Chin Lin's work in semiconductor manufacturing exemplifies the innovative spirit of modern inventors. His patents reflect a commitment to advancing technology and improving the efficiency of semiconductor devices.