Enter inventor name

Yuan-Ko Hwang

This inventor holds 24 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Vanguard International Semiconductor Corporation. Active years: 1999-2024.

USPTO Granted Patents = 24

% Patents Active = 75.0

Average Co-Inventor Count = 2.4

ph-index = 7

Forward Citations = 136(Granted Patents)

Location History:

Hualien Hsien, TW (2001 - 2003)
Huilan, TW (2004)
Huantien, TW (2004)
Hualien, TW (1999 - 2009)
Hsinchu, TW (2016 - 2024)

Company Filing History:

23 out of 42,810

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

1 out of 1,132

Vanguard International Semiconductor Corporation

patents

Years Active: 1999-2024

Loading Chart...

Areas of Expertise:

Epitaxy Formation

Photoresist Stripping

Polysilicon Fuse

MEMS Devices

Capacitor Fabrication

Electrostatic Chucking

Plasma Etching

Contamination Removal

Redistribution Layer

Ion Implantation

Threshold Voltage Shift

Etch Rate Control

24 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11935951 - Metal-insensitive epitaxy formation (2024-03-19),

2. 11495685 - Metal-insensitive epitaxy formation (2022-11-08),

3. 10804395 - Metal-insensitive epitaxy formation (2020-10-13),

4. 10263108 - Metal-insensitive epitaxy formation (2019-04-16),

5. 10134694 - Method of forming redistribution layer (2018-11-20),

6. 9373594 - Under bump metallization (2016-06-21),

7. 7576374 - Semiconductor device with robust polysilicon fuse (2009-08-18),

8. 7384799 - Method to avoid amorphous-si damage during wet stripping processes in the manufacture of MEMS devices (2008-06-10),

9. 7144673 - Effective photoresist stripping process for high dosage and high energy ion implantation (2006-12-05),

10. 7083897 - Method of fabricating a poly fuse (2006-08-01),

11. 6908813 - Method of forming tiny silicon nitride spacer for flash EPROM by fully wet etching technology (2005-06-21),

12. 6723654 - Method and apparatus for in-situ descum/hot bake/dry etch photoresist/polyimide layer (2004-04-20),

13. 6706601 - Method of forming tiny silicon nitride spacer for flash EPROM by using dry+wet etching technology (2004-03-16),

14. 6617221 - Method of making capacitors (2003-09-09),

15. 6489227 - Method of etching a polysilicon layer during the stripping of the photoresist shape used as an etch mask to create an opening to an underlying fuse structure (2002-12-03),

Title: The Innovative Journey of Yuan-Ko Hwang

Introduction: Yuan-Ko Hwang, a distinguished inventor hailing from Hualien, Taiwan, has made significant contributions to the field of technology with his groundbreaking inventions.

Latest Patents: Yuan-Ko Hwang's latest patents focus on advancements in renewable energy technologies, particularly in the development of solar power systems that are more efficient and cost-effective.

Career Highlights: With a career spanning over two decades, Yuan-Ko Hwang has established himself as a pioneer in the tech industry. His innovative spirit has led to the creation of numerous patents that have revolutionized the way we harness and utilize energy.

Collaborations: Throughout his career, Yuan-Ko Hwang has collaborated with leading research institutions and universities to further his research and bring his inventions to life. His partnerships have been instrumental in pushing the boundaries of technological innovation.

Conclusion: Yuan-Ko Hwang's relentless pursuit of innovation and his passion for creating a sustainable future through technology make him a true visionary in the world of inventions. His contributions continue to inspire and shape the landscape of the tech industry.

Profile summary based on public USPTO records.

Please report any incorrect information to [email protected]