The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
May. 15, 2003
Yuan-pang Lee, Miaoli, TW;
Chen-shiang Shieh, Hsinchu, TW;
Ping-hung Yin, Taipei, TW;
Fei-yun Chen, Hsinchu, TW;
Yuan-ko Hwang, Hualien, TW;
Yuan-Pang Lee, Miaoli, TW;
Chen-Shiang Shieh, Hsinchu, TW;
Ping-Hung Yin, Taipei, TW;
Fei-Yun Chen, Hsinchu, TW;
Yuan-Ko Hwang, Hualien, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A new method is provided to create a polysilicon fuse. The invention provides for applying a first oxide plasma treatment to the surface of the created polysilicon fuse, creating a thin layer of native oxide over the surface of the created polysilicon fuse, followed by a DI water rinse. This thin layer of native oxide is made more robust by applying a second oxide plasma treatment to exposed surfaces, this more robust layer of native oxide protects the polysilicon fuse during subsequent processing steps of wet photoresist and polymer removal.