Chen-Shiang Shieh

Title: Innovations by Chen-Shiang Shieh

Introduction

Chen-Shiang Shieh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the reliability and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is titled "Semiconductor device with robust polysilicon fuse." This invention introduces a new method for creating a polysilicon fuse. The process involves applying a first oxide plasma treatment to the surface of the polysilicon fuse, which creates a thin layer of native oxide. Following this, a DI water rinse is performed. To enhance the robustness of this layer, a second oxide plasma treatment is applied to the exposed surfaces. This more durable layer of native oxide protects the polysilicon fuse during subsequent processing steps, including wet photoresist and polymer removal. Another notable patent is the "Method of fabricating a poly fuse," which follows a similar innovative approach to improve the polysilicon fuse's reliability.

Career Highlights

Chen-Shiang Shieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies and advancements in semiconductor manufacturing.

Collaborations

Throughout his career, Chen-Shiang has collaborated with notable colleagues, including Yuan-Pang Lee and Ping-Hung Yin. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the semiconductor field.

Conclusion

Chen-Shiang Shieh's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods for enhancing polysilicon fuses demonstrate his commitment to advancing technology and improving manufacturing processes.