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For the Inventor, By the Inventor

Jungli, Taiwan

Yuan-Hsun Wu

This inventor holds 17 USPTO granted patents. Top assignee: Nan Ya Technology Corporation. Active years: 2003-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuan-Hsun Wu. Retrieved from https://idiyas.com/inventor/yuan-hsun-wu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17

% Patents Active = 100.0

Average Co-Inventor Count = 1.5

ph-index = 4

Forward Citations = 139(Granted Patents)


Location History:

  • Jungli, TW (2003 - 2006)
  • Tao-Yuan Hsien, TW (2005 - 2009)
  • Chungli, TW (2004 - 2010)

Company Filing History:

goldMedal17 out of 2,570 
 
Nan Ya Technology Corporation
 patents

Years Active: 2003-2010

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17 patents (USPTO):Explore Patents
1. 7811723 - Phase-shift mask and method for forming a pattern (2010-10-12),
2. 7504184 - Phase-shifting mask for equal line/space dense line patterns (2009-03-17),
3. 7504183 - Chromeless phase-shifting mask for equal line/space dense line patterns (2009-03-17),
4. 7419882 - Alignment mark and alignment method for the fabrication of trench-capacitor dram devices (2008-09-02),
5. 7205075 - Method of forming a vertical memory device with a rectangular trench (2007-04-17),
6. 7165233 - Test ket layout for precisely monitoring 3-foil lens aberration effects (2007-01-16),
7. 7014965 - Photolithography method for reducing effects of lens aberration (2006-03-21),
8. 7012763 - Aperture plate for lithography systems (2006-03-14),
9. 6998226 - Method of forming patterned photoresist layer (2006-02-14),
10. 6977715 - Method for optimizing NILS of exposed lines (2005-12-20),
11. 6929902 - Method of preventing repeated collapse in a reworked photoresist layer (2005-08-16),
12. 6866975 - Best focus determining method (2005-03-15),
13. 6858355 - Mask and method for defining a guard ring pattern (2005-02-22),
14. 6847445 - Method for estimating repair accuracy of a mask shop (2005-01-25),
15. 6759328 - Masks and method for contact hole exposure (2004-07-06),

Title: Innovations of Yuan-Hsun Wu

Introduction

Yuan-Hsun Wu is a prominent inventor based in Jungli, Taiwan. He has made significant contributions to the field of technology, particularly in the development of phase-shift masks. With a total of 17 patents to his name, Wu's work has had a considerable impact on the industry.

Latest Patents

Among his latest patents is a phase-shift mask and method for forming a pattern. This invention includes a glass substrate and a pattern, featuring a first phase-shift region, a second phase-shift region, and a third phase-shift region on the glass substrate. The first and second phase-shift regions are alternately arranged, while the third phase-shift regions are located at the terminal ends of the first phase-shift region. Another notable patent is the phase-shifting mask for equal line/space dense line patterns. This mask is designed for equal line/space, small pitched, dense line patterns and includes a transparent substrate with a partially shielded mesa line pattern of the first phase formed on it. The design ensures that the light passing through the clear regions of the first phase and the clear recessed line pattern of the second phase have a phase difference of 180 degrees.

Career Highlights

Yuan-Hsun Wu is currently employed at Nan Ya Technology Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of phase-shift masks, which are crucial in the semiconductor manufacturing process.

Collaborations

Wu has collaborated with several talented individuals in his field, including Yung-Long Hung and Wen-Bin Wu. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Yuan-Hsun Wu's contributions to the field of technology through his patents and innovations have established him as a key figure in the industry. His work continues to influence advancements in semiconductor manufacturing and related technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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