The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2006
Filed:
Jul. 10, 2002
Yuan-hsun Wu, Jungli, TW;
Wen-bin Wu, Taoyuan, TW;
Yung Long Hung, Shulin, TW;
Ya Chih Wang, Yunghe, TW;
Yuan-Hsun Wu, Jungli, TW;
Wen-Bin Wu, Taoyuan, TW;
Yung Long Hung, Shulin, TW;
Ya Chih Wang, Yunghe, TW;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
A method of forming a patterned photoresist layer. First, an anti-reflection coating layer is formed on a substrate. Next, a first bake is performed. A photoresist layer is then formed on the anti-reflection coating layer. Exposure is performed. A second bake is performed, wherein the temperature difference between the first bake and the second bake is about 35 ° C.˜55 ° C. Finally, development is performed. The patterned photoresist layer features have perfect profiles in accordance with this invention.