The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2005
Filed:
May. 19, 2004
Applicant:
Yuan-hsun Wu, Tao-Yuan Hsien, TW;
Inventor:
Yuan-Hsun Wu, Tao-Yuan Hsien, TW;
Assignee:
Nanya Technology Corp., Tao-Yuan Hsien, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/42 ; G03B027/32 ;
U.S. Cl.
CPC ...
Abstract
A method for optimizing NILS of exposed lines includes providing a photomask layout which has a first straight line and a second straight line parallel with the first straight line and is applied to a Quasar 90 illumination, and adding a first assist pattern between the first and second straight lines, wherein the first assist pattern has a plurality of geometric patterns with similar size arranging as a line parallel with the first straight line.